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The Effect of UV Intensity and Wavelength on the Photolysis of Triclosan (TCS)  

Son, Hyun-Seok (Institute of Health & Environmental, School of Public Health, Seoul National University)
Choi, Seok-Bong (Center for Nanoscale Science and Engineering, North Dakota State University)
Khan, Eakalak (Department of Civil Engineering and Construction, North Dakota State University)
Zoh, Kyung-Duk (Institute of Health & Environmental, School of Public Health, Seoul National University)
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Abstract
We investigated the effect of hydroxyl radicals on the photolysis of triclosan (TCS), which is a potent broad-spectrum antimicrobial agent. TCS degradation during the initial reaction time of 5 min followed a pseudo-first order kinetic model ai all light intensities at a wavelength of 365 nm and at the low light intensities at a wavelength of 254 nm. The photodegradation rate significantly increased with decreasing wavelength and increasing the UV intensities. The activity of hydroxyl radicals was suppressed when methanol was used as the solvent instead of water. An increase in the photon effect was observed when the UV intensity was higher than $5.77{\times}10^{-5}$ einstein $L^{-1}min^{-1}$ at 254 nm, and lower than $1.56{\times}10^{-4}$ einstein $L^{-1}min^{-1}$ at 365 nm. The quantum yield efficiency for the photolysis of TCS was higher at 365 nm than at 254 nm among the above mentioned UV intensities. Dibenzodichloro-p-dioxin (DCDD) and dibenzo-p-dioxin were detected as intermediates at both UV intensities of $1.37{\times}10^{-4}$ and $1.56{\times}10^{-4}$ einstein $L^{-1}min^{-1}$ at 365 nm. Dichlorophenol and phenol were also detected in all cases. Based on our findings, we presented a possible mechanism of TCS photolysis.
Keywords
Photolysis; TCS; Quantum Yield; UV Intensity; Wavelength; DCDD;
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