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http://dx.doi.org/10.3795/KSME-B.2008.32.2.149

Effect of Contact Conductance and Semitransparent Radiation on Heat Transfer During CVD Process of Semiconductor Wafer  

Yoon, Yong-Seok (동국대학교 대학원 기계공학과)
Hong, Hye-Jung (동국대학교 대학원 기계공학과)
Song, Myung-Ho (동국대학교 기계공학과)
Publication Information
Transactions of the Korean Society of Mechanical Engineers B / v.32, no.2, 2008 , pp. 149-157 More about this Journal
Abstract
During CVD process of semiconductor wafer fabrication, maintaining the uniformity of temperature distribution at wafer top surface is one of the key factors affecting the quality of final products. Effect of contact conductance between wafer and hot plate on predicted temperature of wafer was investigated. The validity of opaque wafer assumption was also examined by comparing the predicted results with Discrete Ordinate solutions accounting for semitransparent radiative characteristics of silicon. As the contact conductance increases predicted wafer temperature increases and the differences between maximum and minimum temperatures within wafer and between wafer and hot plate top surface temperatures decrease. The opaque assumption always overpredicted the wafer temperature compared to semitransparent calculation. The influences of surrounding reactor inner wall temperature and hot plate configuration are then discussed.
Keywords
Heat Transfer; Hot Plate; Wafer Processing; Discrete Ordinate Method; Semitransparent Radiation;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
Times Cited By SCOPUS : 0
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1 Lee, J. M., 2003, 'Handbook Semiconductor Technology,' Hanrimwon, Seoul
2 Park, Y. H., 2003, 'New Design for Uniform Temperature of Precision Hot Plates,' Journal of the KSME(B), Vol. 27, No. 11, pp. 1525~1533   과학기술학회마을   DOI
3 David, L., Nacer, B., Pascal, B. and Gerard, J., 2006, 'Transient Radiative and Conductive Heat Transfer in Non-gray Semitransparent Two-dimensional Media with Mixed Boundary Conditions,' Heat and Mass Transfer, Vol. 42, No. 4, pp. 322~337   DOI
4 Badgwell, T. A. and Edagar, T. F., 1994, 'Modelling the Wafer Temperature Profile in a Multiwafer LPCVD Furnace,' J. Eletrochem. Soc., Vol. 14, No. 1, pp. 161~172   DOI
5 Lee, K. H. and Viskanta, R., 2001, 'Two-dimensional Combined Conduction and Radiation Heat Transfer : Comparison of the Discrete Ordinates Method and the Diffusion Approximation Methods,' Numerical Heat Transfer(A), Vol. 39, No. 3, pp. 205~225   DOI   ScienceOn
6 McConnell, A. D., Uma, S., Goodson, K.E., 2001, 'Thermal Conductivity of Doped Polysilicon Layers,' J. Microelectromechanical Systems, Vol. 10, No. 3, pp. 360~369   DOI   ScienceOn
7 Song, M. H. and Viskanta, R., 1996, 'Discrete Ordinates Solution of Axisymmetric Radiative Transfer within a Condensed Semitransparent Medium Having Specularly Reflecting Boundaries,' ASME Proceedings of 31st National Heat Transfer Conference at Huston, HTD-Vol. 325, pp. 55~62, ASME, New York
8 Patankar, S. V., 1980, 'Numerical Heat Transfer and Fluid Flow,' Hemisphere, Washington, D.C.
9 Carlson, B. G. and Lathrop, K. D., 1968, 'Transport Theory The Method of Discrete Ordinates,' in Computing Methods in Reaction Physics, Gordon and Breach, Science Publishers, New York
10 Kim, I. K., Jung, M. C,. Kim, W. S., Yu, S. I., Nam, K. H. and Chae, S. K., 1998, 'Thermal Anlysis of the Wafers in LPCVD Process,' Journal of the KSME(B), Vol. 22, No. 5, pp. 651~660
11 Modest, M. F., 1993, 'Radiative Heat Transfer,' McGraw-Hill, Hightstown, New Jersey
12 Merkwitz, M., 2001, 'A Quasi Diffusive Reflective Method for the Calculation of Radiative Heat Transfer in Semitransparent Media between Parallel Planes with Angle Dependent Reflection Behavior,' Heat and Mass Transfer, Vol. 37, No. 2-3, pp. 283~291   DOI