Browse > Article
http://dx.doi.org/10.3795/KSME-A.2009.33.3.196

Study on Optical Properties of Lithium Niobate Using CMP  

Jeong, Suk-Hoon (부산대학교 대학원 기계공학과)
Kim, Young-Jin (부산대학교 대학원 기계공학과)
Lee, Hyun-Seop (부산대학교 대학원 기계공학과)
Jeong, Hae-Do (부산대학교 기계공학부)
Publication Information
Transactions of the Korean Society of Mechanical Engineers A / v.33, no.3, 2009 , pp. 196-200 More about this Journal
Abstract
Lithium niobate ($LN:LiNbO_3$) is a compound of niobium, lithium and oxygen. The characteristics of LN are piezoelectricity, ferroelectricity and photoelectricity, and which is widely used in surface acoustic wave (SAW). To manufacture LN devices, the LN surface should be a smooth surface and defect-free because of optical property, but the LN material is processed difficult b traditional processes such as grinding and mechanical polishing (MP) because of its brittleness. To decrease defects, chemical mechanical polishing (CMP) was applied to the LN wafer. In this study, the suitable parameters such as down force and relative velocity, were investigated for the LN CMP process To improve roughness, the LN CMP was performed using the parameters that were the highest removal rate among process parameters. And, evaluation of optical property was performed by the optical reflectance.
Keywords
Lithium niobate; Chemical mechanical polishing; Optical property; Roughness;
Citations & Related Records

Times Cited By SCOPUS : 0
연도 인용수 순위
  • Reference
1 Cho, H. C., Jeong, S. H., Park, J. H., Lee, H. J., Oh, J. H., Kim, H. J., and Jeong, H. D., 2008, “Experimental Analysis in Lithium Niobate CMP For Room Temperature Bonding,” Material Science Forum, Vol. 569, pp. 129-132   DOI
2 Shaw, D., and Chang, J., 2001, “A Method to Improve the Efficiency of CMP Process,” IEEE Transaction on Components and Packaging Technologies, Vol. 24, No. 4, pp. 661-666   DOI   ScienceOn
3 Feng. T., 2007, “Nonuniformity of Wafer and Pad in CMP_Kinematic Aspects of View,” IEEE Transaction on Semiconductor Manufacturing, Vol. 20, No. 4, pp. 451-463   DOI   ScienceOn
4 Wu, C. C., Horng, R. H., Wuu, D. S., Chen, T. N., Ho, S. S., Ting, C. J., and Tsai, H. Y., 2006, “Thinning Technology for Lithium Niobate Wafer by Surface Activated Bonding and Chemical Mechanical polishing,” Japanese Journal of Applied Physics, Vol. 45, No. 4B, pp. 3288-3827   DOI
5 KityK, I. V., Makowska-Janusik, M., Fontana, M .D., Aillerie, M., and Abdi, F., 2001, “Nonstoichiometric Defects and Optical Properties in $LiNbO_3$,” J. Phys. Chem., Vol. 105, pp. 12242-12248   DOI   ScienceOn
6 Zheng, Y., Shi, E., Wang, S., Lu, Z., Cui, S., Wang, L., and Zhong, W., 2004, “Domain Structures and Etching Morphologies of Lithium Niobate Crystal with Different Li Contents Grown by TSSG and Double Crucible Czochralski Method,” Crtst. Res. Technol., vol. 39, No. 5, pp. 387-395   DOI   ScienceOn
7 www.crystaltechnology.com
8 Subhadra, K. G., Rao, K. K., and Sirdeshmukh, D. B., 2000, “Systematic Hardness Studies on Lithium Niobate Crystal,” Bull. Master. Sci., Vol. 23, No. 2, pp. 147-150   DOI
9 Li, S. H., and Miller, R. O., 2000, Chemical Mechanical Polishing in Silicon Processing, 1st ed., Academic Press, San Diego
10 Oliver, M. R, 2003, Chemical-Mechanical Planarization of Semiconductor Materials, 1st ed., Springer, Heidelberg
11 Runnes, S. R., Kim, I. K., Schleuter, J., Karlsrud, C., and Desai, M., 1998, “A Modeling Tool for Chemical–Mechanical Polishing Design and Evaluation,” IEEE Transactions of Semiconductor Manrfacturing, Vol. 11, No. 3, pp. 501-510   DOI   ScienceOn
12 Kong, Y., Zhang, W., Chen, X., Xu, J., and Zhang, G., 1999, “OH- Absorption Sepctra of Pure Lithium Niobate Crystals,“ J. Phys.: Condens. Matter, Vol. 11, pp. 2139-2143   DOI   ScienceOn
13 Sun, L., Wang, J., Lv, Q., Liu, B., Guo, F., Wang, R., Cai, W., Xu, Y., and Zhao, L., 2006, “Defect Structure and Optical Damage Resistance of $In:Mg:Fe:LiNbO_3$ Crystals with Various Li/Nb Ratio,” J. of Crystal Growth, Vol. 297, pp. 199-203   DOI   ScienceOn