Browse > Article
http://dx.doi.org/10.3795/KSME-A.2005.29.9.1276

A Study on the CMP of Lithium Tantalate Wafer  

Lee, Hyun-Seop (부산대학교 정밀기계공학과)
Park, Boum-Young (부산대학교 정밀기계공학과)
Seo, Heon-Deok (부산대학교 정밀기계공학과)
Chang, One-Moon (부산대학교 정밀기계공학과)
Jeong, Hae-Do (부산대학교 정밀정형 및 금형가공 연구소)
Publication Information
Transactions of the Korean Society of Mechanical Engineers A / v.29, no.9, 2005 , pp. 1276-1281 More about this Journal
Abstract
Compound semiconductors are the semiconductors composed of more than two chemical elements. Lithium Tantalate$K_I$ wafer is used for several optical devices, especially surface acoustic wave(SAW) device. Because of the lithography in SAW device process, $LiTaO_3$ polishing is needed. In this paper, the commercial slurries $(NALC02371^{TM},\; ILD1300^{TM},\;ceria slurry)$ used for chemical mechanical polishing(CMP) were tested, and the most suitable slurry was selected by measuring material removal rate and average centerline roughness$(R_a)$. From these result, it was proven that $ILD1300^{TM}$ was the most suitable slurry for $LiTaO_3$ wafer CMP due to the chemical reaction between solution in slurry and material.
Keywords
CMP; Compound Semiconductor; Slurry; Lithium Tantalate; Friction Force;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
연도 인용수 순위
1 Tomozawa, M., 1977, 'Oxide CMP Mechanism,' Solid State Technology, p.169
2 Lim Jong-Heun, Lee Jae-Dong, Hong Changki, Cho HanKu and Moon Joo-Tae, 2004, 'Investgation of Uniformity in Ceria based Owide CMP,' Proceeding of the KIEEME Annual Autumn Conference, Vo. 17, pp. 120-124
3 Li Shinhwa and Miller, Robert O., 2000, 'Chemical Mechanical Polishing in Silicon Processing-Semiconductors and Semimetalsm' Academic press, pp. 139-153
4 Park Boumyoung, Lee Hyunseop, Kim Hyoungjae, Seo Heondeok, Kim Gooyoun and Jeong Haedo, 2004, 'Characteristics of Friction Affecting CMP Results,' Journal of KIEEME, pp.1041-1048   과학기술학회마을   DOI   ScienceOn
5 Xiao Hong, 2001, 'Introdution to Semi conductor Manufacturing Techology,' Pearson Education International, pp.108-110
6 Semiconductor monthly, 1997, Korea, No.110, p.72
7 Tascu, S., Moretti, P., Kostriskii, S. and Jacquier, B., 2003, 'Optical Near-Field Measurements of Guided Modes in Various Processed $LiNbO_3\;and\;LiTaO_3$ Channel Waveguides,' Optical Materials, Vol.24. pp.297-302   DOI   ScienceOn
8 Hyunseop Lee, Boumyoung Park, Gooyoun Kim, Huoungjae Kim, Heondeok Seo and Haedo Jeong, 2004, 'Effects of Friction Energu ofn Polishing Resrlts in CMP Precess,' Trans. of KSME A, Vol. 28, No. 11. pp.1807-1812   과학기술학회마을   DOI   ScienceOn
9 Holm, A., Sturzer, Q., Xu, Y. and Weigel, R., 1999, 'Investigation of Surface Acoustic Waves on $LiNbO_3$, Quartz, and $LiTaO_3$ by Laser Probing,' Microelectronic Engineering, Vol. 31. pp. 123-127   DOI   ScienceOn