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http://dx.doi.org/10.3795/KSME-A.2003.27.9.1517

Fabrication of a Micro-Structure by Modified DXRL Process  

Han, Sang-Pil (한국전자통신연구원 광접속모듈팀)
Jeong, Myung-Yung (한국전자통신연구원 광접속모듈팀)
Jung, Suk-Won (전자부품연구원 나노메카트로닉스연구센터)
Kim, Jin-Tae (한국전자통신연구원 광접속모듈팀)
Publication Information
Transactions of the Korean Society of Mechanical Engineers A / v.27, no.9, 2003 , pp. 1517-1523 More about this Journal
Abstract
Deep X-ray lithography (DXRL), a fabrication method for the production of microstructures with a high aspect ratio, plays an important role in the subsequent electroplanting process. However, secondary radiation is generated during X-ray exposure and damages the resist adhesion to the metal layer. To solve adhesion problems, we modified the conventional DXRL process, changing the sequence of polymer adhesion in DXRL process. With optimized X-ray exposure and development conditions based on a calculated and modified X-ray power spectrum, we fabricated various polymer microstructures and achieved a maximum aspect ratio of 40.
Keywords
LIGA; Deep X-Ray Lithography; Synchrotron; Micro-Structure;
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