EVALUATION OF FAR-INFRARED BIB-TYPE GE DETECTORS FABRICATED WITH THE SURFACE-ACTIVATED WAFER BONDING TECHNOLOGY |
Hanaoka, Misaki
(Graduate School of Science, Nagoya University)
Kaneda, Hidehiro (Graduate School of Science, Nagoya University) Oyabu, Shinki (Graduate School of Science, Nagoya University) Hattori, Yasuki (Graduate School of Science, Nagoya University) Tanaka, Kotomi (Graduate School of Science, Nagoya University) Ukai, Sota (Graduate School of Science, Nagoya University) Shichi, Kazuyuki (Graduate School of Science, Nagoya University) Wada, Takehiko (Institute of Space and Astronautical Science, Japan Aerospace Exploration Agency) Suzuki, Toyoaki (SRON Netherlands Institute for Space Research) Watanabe, Kentaroh (Research Center for Advanced Science and Technology, University of Tokyo) Nagase, Koichi (Institute of Space and Astronautical Science, Japan Aerospace Exploration Agency) Baba, Shunsuke (Institute of Space and Astronautical Science, Japan Aerospace Exploration Agency) Kochi, Chihiro (Institute of Space and Astronautical Science, Japan Aerospace Exploration Agency) |
1 |
Kaneda, H., et al., 2011, Electrical and Photoconductive Properties at 1.8 K of Germanium |
2 | Petroff, M. D. & Stapelbroek, M. G., 1986, Blocked Impurity Band Detectors, U.S. Patent, 4568960 |
3 | Suzuki, T., et al., 2012, Molecular-Beam Epitaxial Growth of a Far-Infrared Transparent Electrode for Extrinsic Germanium Photoconductors, Publ. Astron. Soc. Pac, 124, 823 DOI |
4 | Takagi, H., et al., 1996, Surface Activated Bonding of Sillicon Wafers at Room Temperature, Appl. Phys. Lett, 68, 2222 DOI |
5 | Takagi, H. & Maeda, R., 2006, Direct Bonding of Two Crystal Substrates at Room Temperature by Ar-beam Surface Activation, J. Cryst. Growth, 292, 429 DOI |
6 | Watanabe, K., et al., 2011, Microscopy and Electrical Properties of Ge/Ge Interfaces Bonded by Surface-Activated Wafer Bonding Technology, Jpn. J. Appl. Phys, 50, 015701 DOI |
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