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http://dx.doi.org/10.7315/CDE.2017.001

Dedication Load Based Dispatching Rule for Load Balancing of Photolithography Machines in Wafer FABs  

Cho, Kang Hoon (Dept. of Industrial Engineering, Ajou Univ.)
Chung, Yong ho (Dept. of Industrial Engineering, Ajou Univ.)
Park, Sang Chul (Dept. of Industrial Engineering, Ajou Univ.)
Publication Information
Korean Journal of Computational Design and Engineering / v.22, no.1, 2017 , pp. 1-9 More about this Journal
Abstract
This research develops dispatching rule for a wafer FABs with dedication constraints. Dedication, mostly considered in a photolithography step, is a feature in a modern FABs in order to increase the yield of machines and achieve the advance of manufacturing technology. However, the dedication has the critical problem because it causes dedication load of machines to unbalance. In this paper, we proposes the dedication load based dispatching rule for load balancing in order to resolve the problem. The objective of this paper is to balance dedication load of photo machines in wafer FABs with dedication constraint. Simulation experiments show that the proposed rule improves the performance of wafer FABs as well as load balance for dedication machines compared to open-loop control based conventional dispatching rule.
Keywords
Closed-loop control; Dedication; Dispatching rule; Load balancing; Open-loop control; Photolithography; Wafer FABs;
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