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DNA Damage by X-ray and Low Energy Electron Beam Irradiation  

Park, Yeun-Soo (Department of Physics, Chungnam National University)
Noh, Hyung-Ah (Department of Physics, Chungnam National University)
Cho, Hyuck (Department of Physics, Chungnam National University)
Dumont, Ariane (University of Sherbrooke)
Ptasinska, Sylwia (University of Sherbrooke)
Bass, Andrew D. (University of Sherbrooke)
Sanche, Leon (University of Sherbrooke)
Publication Information
Journal of Radiation Protection and Research / v.33, no.2, 2008 , pp. 53-59 More about this Journal
Abstract
We observed DNA damages as a function of mean absorbed dose to identify the indirect effect of high-energy radiation such as x-ray. Monolayer films of lyophilized pGEM-3Zf(-) plasmid DNA deposited on tantalum foils were exposed to Al $K{\alpha}$ X-ray (1.5 keV) for 0, 3, 7 and 10 min, respectively, in a condition of ultrahigh vacuum state. We compared DNA damages by X-ray irradiation with those by 3 eV electron irradiation. X-ray photons produced low-energy electrons (mainly below 20 eV) from the tantalum foils and DNA damage was induced chiefly by these electrons. For electron beam irradiation, DNA damage was directly caused by 3 eV electrons. Irradiated DNA was analyzed by agarose gel electrophoresis and quantified by ImagaQuant program. The quantities of remained supercoiled DNA after irradiation were linearly decreased as a function of mean absorbed dose. On the other hand, the yields of nicked circular (single strand break, SSB) and interduplex crosslinked form 1 DNA were linearly increased as a function of mean absorbed dose. From this study, it was confirmed that DNA damage was also induced by low energy electrons ($0{\sim}10\;eV$) even below threshold energies for the ionization of DNA.
Keywords
DNA damage; Indirect action; X-ray; Low-energy electron beam; Dissociative electron attachment;
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