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Measurement of Thickness Distribution of $Si_3N_4$ Membrane Using Phase-Shifting Interferometer  

Lee, Jung-Hyun (Department of Physics, Pohang University of Science and Technology)
Jeong, Seung-Jun (Department of Physics, Pohang University of Science and Technology)
Kang, Jeon-Woong (Department of Physics, Pohang University of Science and Technology)
Jeon, Yun-Seong (Department of Physics, Pohang University of Science and Technology)
Hong, Chung-Ki (Department of Physics, Pohang University of Science and Technology)
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Abstract
The thickness of a Si3N4 thin film with a 100m nominal thickness was measured by use of a Mach-Zehnder interferometer. The map of the phase-delay through the thin film was obtained by an interframe intensity-correlation-matrix method that could elliminate phase-shifting errors. After the spatial phase-shifting errors were treated with a least-squares method, the reference to surface of the phase map was estimated. The overall accuracy of the method was found to be 5nm.
Keywords
phase-shifting interferometer; phase map; thin film; thickness measurement;
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