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http://dx.doi.org/10.5916/jkosme.2013.37.2.144

Analysis of nano-cluster formation in the PECVD process  

Yun, Yongsup (Division of Marine System Engineering, Korea Maritime University)
Publication Information
Journal of Advanced Marine Engineering and Technology / v.37, no.2, 2013 , pp. 144-148 More about this Journal
Abstract
In this paper, the ultra water-repellent thin films were prepared by RF PECVD. On the basis of surface morphology, chemical bonding states and plasma diagnostics, a formation model of clusters for the ultra water-repellent films was discussed from considerations of formation process and laser scattering results. Moreover, using laser scattering method, the relative change of quantity of nano-clusters or size of agglomerates could be confirmed. From the results, the films were deposited with nano-clusters and those of agglomerates, which formed in organosilicon plasma, and formation of agglomerates were depended on the deposition time.
Keywords
Ultra water repellen thin films; SiO:CH; OES; Nano cluster; PECVD;
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Times Cited By KSCI : 1  (Citation Analysis)
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