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The Studies of Conductive and Non-Conductive Multi-Layer Depth Analysis by Radio Frequency Gas-Jet Boosted Glow Discharge Atomic Emission Spectrometry  

Cho, Won Bo (Institute of development, High integrated technology Inc.)
Lee, Seong Hun (Institute of development, High integrated technology Inc.)
Jeong, Jong Pil (Institute of development, High integrated technology Inc.)
Choi, Woo Chang (Institute of development, High integrated technology Inc.)
Borden, Stuart (Institute of development, High integrated technology Inc.)
Kim, Kyu Whan (Institute of development, High integrated technology Inc.)
Kim, Kyung Mi (College of pharmacy, Dongduk women's university)
Kim, Hyo Jin (College of pharmacy, Dongduk women's university)
Jeong, Seong Uk (Pohang research institute of industrial science & technology)
Lee, Jung Ju (Pohang research institute of industrial science & technology)
Publication Information
Analytical Science and Technology / v.15, no.3, 2002 , pp. 236-242 More about this Journal
Abstract
A method was investigated to determine the thickness of coating on steel sheet using rf glow discharge atomic emission spectrometer. The RF gas-jet boosted glow discharge has such salient feature as good pleasure stability and high sputtering efficiency that it was possible to determine the thickness of silicon resin film on zinc electroplated steel. The erosion speed variation is dependent on discharge power, gas flow rate and discharge pressure. therefore determine discharge condition to measure the thickness of coating on steels. The fundamental studies have been carried out to investigate an optimum condition for in-depth analysis and composition of zinc coating on steel. In this study, the calibration curve for thickness determination of silicon resin film was found to be linear in the range of $1000{\sim}3500mg/m^2$ film thickness. The developed rf gas-jet boosted glow discharge was applied to the analysis of zinc coating and silicon resin film on steel made by RIST.
Keywords
RF gas-jet boosted nozzle; Depth profiling; atomic emission sepctrometry;
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  • Reference
1 R. J. MacDonald and B. V. King, 'Surface Analysis Methods in Materials Science'. p117-148, Springer-Verlag, Berlin, Germany.(1992)
2 C. Lazik and R. K. Marcus, Spectrochim. Acta., 48B, 863(1993)
3 P. W. J. M. Boumans, Anal. Chem., 44, 1216(1972)
4 K. Laqua, W. D. Hagenah, and H. Waechter., Z. Anal. Chem.,142, 225(1967)
5 D. A. Skoog and D. D. West, 'Principles of instrumental Analysis',Philadelphia. USA.,(1980)
6 J. S. Johannessen and A. P. Grande, Matter. Sci. Eng., 42, 321(1980)
7 H. J. Kim and E. H. Piepmeier, Anal. Chem., 60, 2040(1988)
8 Z. Weiss and J. Suba. Czech. J. Phys., 42, 539(1992)
9 D. Fang and R. K. Marcus, Spectrochim. Acta., 43B, 1451(1983)
10 R. Payling, D.G. Jones and A. Bengtson, 'Glow Discharge Optical Emission Spectrometry', p 715-725, John Wiley & Sons, New York, USA.(1997)
11 S. Hoffmann and J. M. Sanz, 'Depth Resolution and Quantitative Evaluation of AES Sputtering Profiles', p141, Springer, Berlin, Germany.,(1984)
12 P. R. Bank and M. W. Blades, Spectrochim. Acta., 44B(11), 1117(1989)
13 W. B. Cho and H. J. Kim, Appl. Spectrosc., 51, 1064(1997)
14 W. B. Cho and H. J. Kim, Appl. Spectrosc., 51, 1060(1997)
15 P. R. Bank and M. W. Blades, Spectrochim. Acta., 46B(4), 501(1991)