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In-situ Warpage Measurement Technique Using Impedance Variation  

Kim, Woo Jae (Kwangwoon University Dept. of Electrical and Biological Physics)
Shin, Gi Won (Kwangwoon University Dept. of Electrical and Biological Physics)
Kwon, Hee Tae (Kwangwoon University Dept. of Electrical and Biological Physics)
On, Bum Soo (Kwangwoon University Dept. of Electrical and Biological Physics)
Park, Yeon Su (Kwangwoon University Dept. of Electrical and Biological Physics)
Kim, Ji Hwan (Kwangwoon University Dept. of Electrical and Biological Physics)
Bang, In Young (Kwangwoon University Dept. of Electrical and Biological Physics)
Kwon, Gi-Chung (Kwangwoon University Dept. of Electrical and Biological Physics)
Publication Information
Journal of the Semiconductor & Display Technology / v.20, no.1, 2021 , pp. 32-36 More about this Journal
Abstract
The number of processes in the manufacture of semiconductors, displays and solar cells is increasing. And as the processes is performed, multiple layers of films and various patterns are formed on the wafer. At this time, substrate warpage occurs due to the difference in stress between each film and pattern formed on the wafer. the substrate warping phenomenon occurs due to the difference in stress between each film and pattern formed on the wafer. We developed a new warpage measurement method to measure wafer warpage during real-time processing. We performed an experiment to measure the presence and degree of warpage of the substrate in real time during the process by adding only measurement equipment for applying additional electrical signals to the existing ESC and detecting the change of the additional electric signal. The additional electrical measurement signal applied at this time is very small compared to the direct current (DC) power applied to the electrostatic chuck whit a frequency that is not generally used in the process can be selectively used. It was confirmed that the measurement of substrate warpage can be easily separated from other power sources without affecting.
Keywords
Semiconductor; Warpage measurement;
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Times Cited By KSCI : 1  (Citation Analysis)
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