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Showerhead Surface Temperature Monitoring Method of PE-CVD Equipment  

Wang, Hyun-Chul (School of Electrical, Electronics and Communication Engineering Korea University of Technology and Education)
Seo, Hwa-Il (School of Electrical, Electronics and Communication Engineering Korea University of Technology and Education)
Publication Information
Journal of the Semiconductor & Display Technology / v.19, no.2, 2020 , pp. 16-21 More about this Journal
Abstract
How accurately reproducible energy is delivered to the wafer in the process of making thin films using PE-CVD (Plasma enhanced chemical vapor deposition) during the semiconductor process. This is the most important technique, and most of the reaction on the wafer surface is made by thermal energy. In this study, we studied the method of monitoring the change of thermal energy transferred to the wafer surface by monitoring the temperature change according to the change of the thin film formed on the showerhead facing the wafer. Through this research, we could confirm the monitoring of wafer thin-film which is changed due to abnormal operation and accumulation of equipment, and we can expect improvement of semiconductor quality and yield through process reproducibility and equipment status by real-time monitoring of problem of deposition process equipment performance.
Keywords
Showerhead; Temperature Monitoring; Real-time Monitoring; Fault Detection; PE-CVD; Semiconductor;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
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