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Magnetonic Resistance Properties of Semiconductor Thin Films by Plasmon Effect on Fabricated Si(100) Substrate  

Oh, Teresa (Department of Semiconductor Engineering, Cheongju University)
Publication Information
Journal of the Semiconductor & Display Technology / v.18, no.3, 2019 , pp. 105-109 More about this Journal
Abstract
Plasmons have conductive properties using the effect of amplifying magnetic and electric fields around metal particles. The collective movement of free electrons in metal particles induces and produces the generation of plasmon. Because the plasmon is concentrated on the surface of the nanoparticles, it is also called the surface plasmon. The polarizing effect of plasma on the surface is similar to the principle of surface currents occurring in insulators. In this study, it was found the conditions under which plasma is produced in SiOC insulators and studied the electrical properties of SiOC insulators that are improved in conductivity by plasmons. Due to the heat treatment temperature of thin film, plasma formation was shown differently, metal particles were used with normal aluminium, SiOC thin films were treated with heat at 60 degrees, conductivity was improved dramatically, and heat treatment at higher temperatures was found to be less conductivity.
Keywords
Sputtering; Plasmon; Surface Current; Polarization; Insulator; EM Field;
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