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Design and Preparation of Cathode for Large Sputtering Thin Film  

Kim, Yujin (Dept. of Electrical Engineering, Gachon University)
Kim, Sangmo (Dept. of Electrical Engineering, Gachon University)
Kim, Kyung Hwan (Dept. of Electrical Engineering, Gachon University)
Publication Information
Journal of the Semiconductor & Display Technology / v.18, no.2, 2019 , pp. 53-57 More about this Journal
Abstract
In this study, we prepared sputtering cathode for large sputtering thin film in the facing targets sputtering(FTS) system. Before fabrication of cathode equipment, we investigated optimal magnetic flux in the sputtering cathode by using magnetic field stimulation(Comsol). According to the result of magnetic field stimulation, we manufactured the cathode. After we mounted laboratory-designed cathode on FTS system, the discharge properties were observed in vacuum condition. In addition, ITO films were deposited on glass substrate and their electrical and optical properties were investigated by various measurements (four-point probe, UV-VIS spectrometer, field emission scanning electron microscopy(FE-SEM), Hall-effect measurement).
Keywords
Cathode; Sputtering; Magnetic; Stimulation; ITO;
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Times Cited By KSCI : 4  (Citation Analysis)
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