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Study on the Flat Zone Expansion and Temperature Deviation Reduction of Low Temperature Furnace for Semiconductor Process  

Joo, Kang Wo (KOREATECH School of Mechatronics Engineering)
Shim, Seung Sool (YesT CO., Ltd.)
Jang, Hyeok (JLT CO., Ltd.)
Lee, You Young (Korea Polytechnics Asan)
Kim, Kwang Sun (KOREATECH School of Mechatronics Engineering)
Publication Information
Journal of the Semiconductor & Display Technology / v.13, no.4, 2014 , pp. 83-90 More about this Journal
Abstract
This paper is about the yield rate of lower temperature furnace for wafer heat-treatment. The flat-zone that the temperature in furnace has uniform distribution specific area is the significant variable to the yield rate. In this study, we researched about the ways how to widen the flat zone in the furnace using CFD. As a result, we confirmed that the characteristic of the flat-zone was changed when SCU(Super Cooling Unit) was used. We considered temperature control with above.
Keywords
Furnace; Temperature control; Flat zone; CFD;
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