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Silicon Solar Cell Efficiency Improvement with surface Damage Removal Etching and Anti-reflection Coating Process  

Cho, Chan Seob (Shool of Electrical Engineering, Kyungpook National University)
Oh, Jeong Hwa (Samsung Electronics)
Lee, Byeungleul (School of Mechatronics Engineering, Korea University of Technology and Education)
Kim, Bong Hwan (Department of Electronics Engineering, Catholic University of Daegu)
Publication Information
Journal of the Semiconductor & Display Technology / v.13, no.2, 2014 , pp. 29-35 More about this Journal
Abstract
In this study general solar cell production process was complemented, with research on improvement of solar cell efficiency through surface structure and thermal annealing process. Firstly, to form the pyramid structure, the saw damage removal (SDR) processed surface was undergone texturing process with reactive ion etching (RIE). Then, for the formation of smooth pyramid structure to facilitate uniform doping and electrode formation, the surface was etched with HND(HF : HNO3 : D.I. water=5 : 100 : 100) solution. Notably, due to uniform doping the leakage current decreased greatly. Also, for the enhancement and maintenance of minority carrier lifetime, antireflection coating thermal annealing was done. To maintain this increased lifetime, front electrode was formed through Au plating process without high temperature firing process. Through these changes in two processes, the leakage current effect could be decreased and furthermore, the conversion efficiency could be increased. Therefore, compared to the general solar cell with a conversion efficiency of 15.89%, production of high efficiency solar cell with a conversion efficiency of 17.24% was made possible.
Keywords
Solar cell; RIE texturing; HND process; DRE(damage removal etching); ARC;
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Times Cited By KSCI : 1  (Citation Analysis)
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