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Large Area Nanostructure Fabrication by Laser Interference Lithography  

Jeong, Il Gyu (Advanced Convergent Technology R&D Group, Korea Institute of Industrial Technology)
Kim, Jongseok (Smart System R&D Group, Korea Institute of Industrial Technology)
Hahn, Jae Won (School of Mechanical Engineering, Yonsei University)
Lee, Sung Ho (Advanced Convergent Technology R&D Group, Korea Institute of Industrial Technology)
Publication Information
Journal of the Semiconductor & Display Technology / v.11, no.1, 2012 , pp. 7-11 More about this Journal
Abstract
One dimensional and two dimensional nano patterns were fabricated on a 4-inch substrate by Laser Interference Lithography (LIL). Mach-Zehnder interferometer was setup to obtain the interference patterns and adjusted the pattern sizes with change of incident angle. We could obtain a periodic structure with a period of 440 nm using 266 nm laser, and demonstrated a pattern size with $293{\pm}25nm$ over a 4-inch substrate.
Keywords
Large area; Laser Interference Lithography(LIL); Nano structure; Uniformity; Mach-Zehnder;
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