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Effect of substrate temperature on the properties of AZO thin film deposited by using facing targets sputtering system  

Jung, Yu Sup (Department of Electrical Engineering, Gachon University)
Choi, Myung Kyu (Department of Electrical Engineering, Gachon University)
Kim, Kyung Hwan (Department of Electrical Engineering, Gachon University)
Publication Information
Journal of the Semiconductor & Display Technology / v.11, no.1, 2012 , pp. 1-5 More about this Journal
Abstract
Al doped ZnO (AZO) thin film was deposited by using Facing Target Sputtering (FTS) system. This work examined the properties of AZO thin film as a function of the substrate temperature. The sputtering targets were 4 inch diameter disks of AZO (ZnO : $Al_2O_3$ = 98 : 2 wt.% ). The properties of electrical, structural and optical were investigated by 4-point probe, Hall effect measurement, x-ray diffractometer (XRD), field-emitting scanning electron microscopy (FE-SEM), and UV/VIS spectrometer. The lowest resistivity of films was $5.67{\times}10^{-4}{\Omega}.cm$ and the average optical transmittance of the films was above 85% in the visible range.
Keywords
AZO; Substrate temperature; Facing targets sputtering;
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