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A Wafer Pre-Alignment System Using One Image of a Whole Wafer  

Koo, Ja-Myoung (Dept. of Electrical and Electronics Engineering, Korea University of Technology and Education)
Cho, Tai-Hoon (School of Computer Engineering, Korea University of Technology and Education)
Publication Information
Journal of the Semiconductor & Display Technology / v.9, no.3, 2010 , pp. 47-51 More about this Journal
Abstract
This paper presents a wafer pre-alignment system which is improved using the image of the entire wafer area. In the previous method, image acquisition for wafer takes about 80% of total pre-alignment time. The proposed system uses only one image of entire wafer area via a high-resolution CMOS camera, and so image acquisition accounts for nearly 1% of total process time. The larger FOV(field of view) to use the image of the entire wafer area worsen camera lens distortion. A camera calibration using high order polynomials is used for accurate lens distortion correction. And template matching is used to find a correct notch's position. The performance of the proposed system was demonstrated by experiments of wafer center alignment and notch alignment.
Keywords
Wafer Pre-Aligner; Wafer Pre-Alignment System; Wafer Center Alignment; Notch Alignment;
Citations & Related Records
Times Cited By KSCI : 3  (Citation Analysis)
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