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Journal of Electrical Engineering and Technology

Publisher : The Korean Institute of Electrical Engineers(대한전기학회)
Foundation Date : 2006-03-01
Language : eng
ISSN : 1975-0102
KOJIC : E1EEFQ
KISTI SUBJECT :
SCOPUS SUBJECT : Electrical and Electronic Engineering
WebOfScience SUBJECT : Engineering, Electrical &electronic


Indicators	2006	2007	2008	2009	2010	2011	2012	2013	2014	2015	2016	2017	2018
① Docs.	80	80	80	80	80	120	139	200	273	285	220	272	280
② Docs. (2years)	0	80	160	160	160	160	200	259	339	473	558	505	492
③ Docs. (3years)	0	80	160	240	240	240	280	339	459	612	758	778	777
④ Docs. (5years)	0	80	160	240	320	400	440	499	619	812	1017	1117	1250
⑤ Refs.	824	894	1130	1096	1465	1791	2051	3423	4941	5853	4338	5877	6133
⑥ Cited	1	1	1	3	4	10	14	14	16	30	8	26	8
⑦ Cited (2years)	0	8	20	18	16	45	52	70	97	170	110	115	92
⑧ Cited (3years)	0	8	20	21	24	50	69	85	125	205	151	169	117
⑨ Cited (5years)	0	8	20	21	26	64	78	110	174	246	200	230	160
⑩ Self Cited	0	1	0	0	1	3	2	7	6	23	2	16	4
⑪ Self Cited (2years)	0	4	5	4	5	29	25	32	68	137	51	68	63
⑫ Self Cited (3years)	0	4	5	4	7	31	34	41	82	137	71	110	79
⑬ Self Cited (5years)	0	4	5	4	8	37	39	53	113	162	93	153	113
ⓐ Impact Factor (2years) [⑦/②]	0	0.1	0.125	0.113	0.1	0.281	0.26	0.27	0.286	0.359	0.197	0.228	0.187
ⓑ Impact Factor (3years) [⑧/③]	0	0.1	0.125	0.088	0.1	0.208	0.246	0.251	0.272	0.335	0.199	0.217	0.151
ⓒ Impact Factor (5years) [⑨/④]	0	0.1	0.125	0.088	0.081	0.16	0.177	0.22	0.281	0.303	0.197	0.206	0.128
ⓓ Immediacy Index [⑥/①]	0.013	0.013	0.013	0.038	0.05	0.083	0.101	0.07	0.059	0.123	0.036	0.096	0.029
ⓔ ZIF (2years) [(⑦-⑪)/②]	0	0.05	0.094	0.088	0.069	0.1	0.135	0.147	0.086	0.116	0.106	0.093	0.059
ⓕ ZIF (3years) [(⑧-⑫)/③]	0	0.05	0.094	0.071	0.071	0.079	0.125	0.13	0.094	0.111	0.106	0.076	0.049
ⓖ ZIF (5years) [(⑨-⑬)/④]	0	0.05	0.094	0.071	0.056	0.068	0.089	0.114	0.099	0.103	0.105	0.069	0.038
ⓗ Self Citing Rate [⑩/⑤]	0	0.001	0	0	0.001	0.002	0.001	0.002	0.001	0.004	0	0.003	0.001
ⓘ Self Cited Rate [⑩/⑥]	0	1	0	0	0.25	0.3	0.143	0.5	0.375	0.743	0.25	0.615	0.5

KSCI

Journal of Electrical Engineering and Technology

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