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1 Review on Atomic Layer Deposition of HfO2-based Ferroelectrics for Semiconductor Devices
Lee, Younghwan;Kwon, Taegyu;Park, Min Hyuk; / The Korean Institute of Surface Engineering , v.55, no.5, pp.247-260,
2 Enhanced CO2 electrocatalytic conversion via surface treatment employing low temperature plasma
Choi, Yong-Wook; / The Korean Institute of Surface Engineering , v.55, no.5, pp.261-272,
3 Microstructural Analysis on Oxide Film of Al6061 Exposed to Atmospheric Conditions
Jo, Junyeong;Kwon, Daeyeop;Choi, Wonjun;Bahn, Chi Bum; / The Korean Institute of Surface Engineering , v.55, no.5, pp.273-283,
4 ZnO/Cu/Al2O3 transparent heaters fabricated by magnetron sputtering
Min, Changheum;Choi, Dooho; / The Korean Institute of Surface Engineering , v.55, no.5, pp.284-291,
5 PEO Film Formation Behavior of AZ31 Mg Alloy under Pulse Current
Moon, Sungmo; / The Korean Institute of Surface Engineering , v.55, no.5, pp.292-298,
6 Effect of underlayer electroless Ni-P plating on deposition behavior of cyanide-free electroless Au plating
Kim, DongHyun;Han, Jaeho; / The Korean Institute of Surface Engineering , v.55, no.5, pp.299-307,