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Design of 32 bit Parallel Processor Core for High Energy Efficiency using Instruction-Levels Dynamic Voltage Scaling Technique
Yang, Yil-Suk;Roh, Tae-Moon;Yeo, Soon-Il;Kwon, Woo-H.;Kim, Jong-Dae;
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The Institute of Electronics and Information Engineers
, v.9, no.1, pp.1-7,
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2 |
Timing Analysis of Discontinuous RC Interconnect Lines
Kim, Tae-Hoon;Song, Young-Doo;Eo, Yung-Seon;
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The Institute of Electronics and Information Engineers
, v.9, no.1, pp.8-13,
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3 |
A Low-Voltage High-Speed CMOS Inverter-Based Digital Differential Transmitter with Impedance Matching Control and Mismatch Calibration
Bae, Jun-Hyun;Park, Sang-Hune;Sim, Jae-Yoon;Park, Hong-June;
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The Institute of Electronics and Information Engineers
, v.9, no.1, pp.14-21,
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4 |
A Fast RSSI using Novel Logarithmic Gain Amplifiers for Wireless Communication
Lee, Sung-Ho;Song, Yong-Hoon;Nam, Sang-Wook;
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The Institute of Electronics and Information Engineers
, v.9, no.1, pp.22-28,
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5 |
Clock Scheduling and Cell Library Information Utilization for Power Supply Noise Reduction
Kim, Yoo-Seong;Han, Sang-Woo;Kim, Ju-Ho;
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The Institute of Electronics and Information Engineers
, v.9, no.1, pp.29-36,
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6 |
A Scaling Trend of Variation-Tolerant SRAM Circuit Design in Deeper Nanometer Era
Yamauchi, Hiroyuki;
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The Institute of Electronics and Information Engineers
, v.9, no.1, pp.37-50,
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7 |
Characteristics of p-Cu2O/n-Si Heterojunction Photodiode made by Rapid Thermal Oxidation
Ismail, Raid A.;
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The Institute of Electronics and Information Engineers
, v.9, no.1, pp.51-54,
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8 |
Extraction of Ballistic Parameters in 65 nm MOSFETs
Kim, Jun-Soo;Lee, Jae-Hong;Kwon, Yong-Min;Park, Byung-Gook;Lee, Jong-Duk;Shin, Hyung-Cheol;
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The Institute of Electronics and Information Engineers
, v.9, no.1, pp.55-60,
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9 |
Investigation of Frequency Dependent Sensitivity of Noise Figure on Device Parameters in 65 nm CMOS
Koo, Min-Suk;Jung, Hak-Chul;Jhon, Hee-Sauk;Park, Byung-Gook;Lee, Jong-Duk;Shin, Hyung-Cheol;
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The Institute of Electronics and Information Engineers
, v.9, no.1, pp.61-66,
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Monte Carlo Simulation of Ion Implantation Profiles Calibrated for Various Ions over Wide Energy Range
Suzuki, Kunihiro;Tada, Yoko;Kataoka, Yuji;Nagayama, Tsutomu;
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The Institute of Electronics and Information Engineers
, v.9, no.1, pp.67-74,
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