Journal of Korean Society of Occupational and Environmental Hygiene (한국산업보건학회지)

Korean Industrial Hygiene Association (한국산업보건학회)
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Development of a General Occupational Safety and Health (OSH) Guide for Maintenance in Etching, Deposition, and Ion Implantation Facilities

반도체 공정 설비 정비 작업 안전보건 가이드: 증착, 식각, 이온주입

  • Kyung Ehi Zoh (Department of Environmental Health, Graduate School of Public Health, Seoul National University) ;
  • Taek-hyeon Han (Partner Environment & Safety Team, Samsung Electronics) ;
  • Jae-jin Moon (SHE Collaboration, SK Hynix) ;
  • Ingyun Jung (SHE Collaboration, SK Hynix) ;
  • Yeong Woo Hwang (Health Care Policy Task, LG Display) ;
  • Seyoung Kwon (Korea Occupational Safety and Health Agency) ;
  • Kyung-yoon Ko (Graduate School of Public Health and Healthcare Management, The Catholic University of Korea) ;
  • Mingun Lee (Department of Environmental Health, Korea National Open University) ;
  • Jaepil Chang (Korea Occupational Safety and Health Agency) ;
  • Dong-Uk Park (Department of Environmental Health, Korea National Open University)
  • 조경이 (서울대학교 보건대학원 환경보건학과) ;
  • 한택현 (삼성전자 상생EHS팀) ;
  • 문재진 (SK하이닉스 SHE상생협력) ;
  • 정인균 (SK하이닉스 SHE상생협력) ;
  • 황영우 (LG 디스플레이 보건정책 Task) ;
  • 권세영 (한국산업안전공단) ;
  • 고경윤 (가톨릭대학교 보건의료경영대학원) ;
  • 이민건 (한국방송대학교 보건환경학과 ) ;
  • 장재필 (한국산업안전공단) ;
  • 박동욱 (한국방송대학교 보건환경학과 )
  • Received : 2024.05.29
  • Accepted : 2024.06.27
  • Published : 2024.06.30
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Abstract

Objectives: The aim of this study is to develop a comprehensive Occupational Safety and Health (OSH) guide for maintenance tasks in semiconductor processing, specifically focusing on etching, deposition, and ion implantation processes. Methods: The development of the OSH guide involved a literature review, consultations with industry experts, and field investigations. It concentrates on Maintenance Work (MW) operations in these specialized areas. Results: The result is a detailed OSH guide tailored to MW in etching, deposition, and ion implantation facilities within semiconductor processing. This guide is structured to assist maintenance workers through pre-, during and post-MW phases, ensuring easy comprehension and adherence to safety protocols. It highlights the necessity of safety and health measures throughout the MW process to protect personnel. The guide is enriched with real-life scenarios and visual aids, including cartoons and photographs, to aid in the understanding and implementation of safety and health principles. Conclusions: This OSH guide is designed to enhance the protection of workers engaged in maintenance activities in the electronics sector, particularly in semiconductor manufacturing. It aims to improve compliance with safety and health standards in these high-risk environments.

Keywords

References

  1. AZoM. Metallographic etching - the processes, reasons to etch and what etching achieves 2006 [cited 2024 Jan 10]. Available from: https://www.azom.com/article.aspx?ArticleID=3504
  2. Britannica. Standard operating procedure 2023 [cited 2023 11 08]. Available from: https://www.britannica.com/technology/standardization
  3. Bundesmann C & Neumann H. Tutorial: The systematics of ion beam sputtering for deposition of thin films with tailored properties. Journal of Applied Physics. 2018;124(23).)
  4. EU-OSHA. E-facts 66: maintenance and hazardous substances. 2012 [cited 2024 Jan 10]. Available from: https://osha.europa.eu/sites/default/files/66-maintenance-hazaedous-substances.pdf
  5. Global_IndustryAnalysts. Ion Implanters - global strategic business report. 2024.
  6. Hirvoney J. Industrial applications of ion implantation. MRS Online Proceedings Library. 1983;27:621-9.)
  7. HSA. Maintenance fact sheet: Health and Safety Authority; 2024 [Available from: https://www.hsa.ie/eng/vehicles_at_work/workplace_transport_safety/managing_workplace_priority_risks/maintenance.pdf
  8. HSE. Managing risks and risk assessment at work: Health and Safety Executive; 2024 [cited 2023 11 09]. Available from: https://www.hse.gov.uk/simple-health-safety/risk/risk-assessment-template-and-examples.htm
  9. INQUIVIX. Semiconductor sputtering: what is this process and why is it used? 2023 [cited 2024 Jan 10]. Available from: https://inquivixtech.com/semiconductor-sputtering-process/
  10. ISC. Safe operating procedure (SOP) 2023 [cited 2023 11 08]. Available from: https://www.internationalsafetyconsultants.com/safe-operating-procedure-sop/
  11. Kern W & Schuegraf KK. Deposition technologies and applications: Introduction and overview. Handbook of Thin Film Deposition Processes and Techniques: Elsevier; 2001. p. 11-43
  12. Kim S, Lee S, Park J, Han TH, Moon JJ et al. Development of a general occupational wafety and health (OSH) guide for maintenance work at electronic Industry process facilities. Journal of Korean Society of Occupational and Environmental Hygiene. 2024;34(1):in press.)
  13. Lee S, Kim S, Zoh KE, Whang Y, Lee KH et al. Development of an occupational safety and Hhealth (OSH) guide for safely cleaning contaminated machinery, equipment, and parts used in the electronics manufacturing process. Journal of Korean Society of Occupational and Environmental Hygiene. 2023;33(4):419-26. (https://doi.org/10.15269/JKSOEH.2023.33.4.419)
  14. Muylaert K, Eeckelaert L, Brueck C, Lafrenz B, Jachowicz M et al. Safe maintenance in practice: Office for Official Publications of the European Communities; 2010
  15. OSHA. Device Fabrication 2024a [Available from: https://www.osha.gov/semiconductors/silicon/device-fabrication
  16. OSHA. Semiconductors 2024b [cited 2024 Jan 10]. Available from: https://www.osha.gov/semiconductors
  17. Safety Culture. Breakdown maintenance 2024 [cited 2023 11 09]. Available from: https://safetyculture.com/topics/breakdown-maintenance/#:~:text=The%20main%20difference%20between%20the%20two%20is%20the,or%20short-life%20assets%20encounter%20machine%20failure%20or%20disruption
  18. Selwyn GS, Weiss CA, Sequeda F & Huang C. Particle contamination formation in magnetron sputtering processes. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 1997;15(4):2023-8.)
  19. SEMI. SEMI International Standards 2024 [cited 2024 Jan 10]. Available from: https://semi.org/ko/products-services/standards#:~:text=SEMI%20%ED%91%9C%EC%A4%80%EC%9D%80%20%EC%88%98%EB%B0%B1%EB%A7%8C%20%EA%B0%9C%EC%9D%98%20%EC%84%9C%EB%A1%9C%20%EB%8B%A4%EB%A5%B8%20%EB%B6%80%ED%92%88%EC%9D%84%20%EA%B3%B5%EA%B8%89%ED%95%98%EB%8A%94,%EC%84%9C%ED%94%8C%EB%9D%BC%EC%9D%B4%20%EC%B2%B4%EC%9D%B8%EC%9D%80%20%ED%95%A8%EA%BB%98%20%ED%98%91%EB%A0%A5%ED%95%98%EA%B3%A0%2C%20%EC%A7%80%EC%9B%90%ED%95%98%EB%A9%B0%2C%20%ED%98%81%EC%8B%A0%ED%95%A0%20%EC%88%98%20%EC%9E%88%EC%8A%B5%EB%8B%88%EB%8B%A4
  20. Sigmund P. Introduction to sputtering. Mat Fys Med Dan Vid Selsk. 1993;43:7-26.)