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Effect of Glass Frit Addition on Characteristics of Yttria Ceramics

이트리아 소결체의 특성에 글라스프릿 첨가가 미치는 영향

  • Ji-Sun Lee (Display Materials Center, Advanced Materials Convergence R&D Division, Korea Institute of Ceramic Engineering & Technology) ;
  • Sunwoog Kim (Display Materials Center, Advanced Materials Convergence R&D Division, Korea Institute of Ceramic Engineering & Technology) ;
  • Mu-Kun Roh (Department of Advanced Materials Engineering, Kangwon National University) ;
  • Chang-Yong Oh (Department of Advanced Materials Engineering, Kangwon National University) ;
  • Jinho Kim (Display Materials Center, Advanced Materials Convergence R&D Division, Korea Institute of Ceramic Engineering & Technology)
  • 이지선 (한국세라믹기술원 소재융합고도화연구본부 디스플레이소재센터) ;
  • 김선욱 (한국세라믹기술원 소재융합고도화연구본부 디스플레이소재센터) ;
  • 노무근 (강원대학교 신소재공학과) ;
  • 오창용 (강원대학교 신소재공학과) ;
  • 김진호 (한국세라믹기술원 소재융합고도화연구본부 디스플레이소재센터)
  • Received : 2024.04.18
  • Accepted : 2024.05.28
  • Published : 2024.06.27

Abstract

The semiconductor and display industries require the development of plasma resistant materials for use in high density plasma etching process equipment. Yttria (Y2O3) is a ceramic material mainly used to ensure good plasma resistance properties, which requires a dense microstructure. In commercial production, a sintering process is applied to reduce the sintering temperature of Y2O3. In this study, the effect of the addition of glass frit to the sintered specimen was examined when manufacturing yttria sintered specimens for semiconductor process equipment parts. The Y2O3 specimen was shaped into a Ø50 mm size and then sintered at 1,600 ℃ for 1~8 h. The characteristics, X-ray diffraction pattern, densities, contraction rate of the specimen, and swelling of the surface of the Y2O3 specimens were investigated as a function of the sintering time and glass frit addition. The Y2O3 specimen exhibited a density of over 4.9 g/cm3 as the sintering time increased, and the swelling phenomenon characteristics were improved by glass frit, by controlling particle size.

Keywords

Acknowledgement

This work was supported by the Development of Regional Specialized Industries Program (S3365391, Development high strength 12-inch yttria plate with 150 MPa over for semiconductor process) funded by the Ministry of SMEs and Startups (MSS, Korea).

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