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Solution of TE Scattering by a Resistive Strip Grating Between a Double Dielectric Layer Using FGMM

FGMM을 이용한 2중 유전체층 사이의 저항띠 격자구조에 의한 TE 산란 해

  • Received : 2023.03.05
  • Accepted : 2023.05.03
  • Published : 2023.05.31
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Abstract

In this paper, TE(transverse electric) scattering problems by a resistive strip grating between a double dielectric layer are analyzed by using the FGMM(fourier galerkin moment method) known as a numerical method of electromagnetic fileld. The boundary conditions are applied to obtain the unknown field coefficients, the scattered electromagnetic fields are expanded in a series of Floquet mode functions, and the resistive boundary condition is applied to analysis of the resistive strip. In order to deal with the problem of the double dielectric layer, numerical calculation was performed only when the thickness and relative permittivity of the dielectric layers had the same value. Overall, as the resistivity of the uniform resistivity increased, the current density induced in the resistive strip decreased, the reflected power decreased, and the transmitted power relatively increased. The numerical results of the structure proposed in this paper are shown in good agreement compared to the results of PMM, a numerical analysis method of the existing paper.

본 논문에서는 2중 유전체층 사이의 저항띠 격자구조에 의한 TE(transverse electric) 산란 문제를 전자파 수치해석 방법으로 알려진 FGMM(fourier galerkin moment method)를 이용하여 해석하였다. 경계조건들은 미지의 계수를 구하기 위하여 이용하였고, 산란 전자계는 Floquet 모드 함수의 급수로 전개하였고, 저항띠의 해석을 위해 저항 경계조건을 적용하였다. 2중 유전체층의 문제를 취급하기 위하여 유전체층들의 두께와 비유전율을 동일한 값을 가지는 경우에 대해서만 수치계산하였다. 전반적으로, 저항띠 균일 저항율이 증가하면 저항띠에 유도되는 전류밀도는 감소하였고 반사 전력은 감소하였으며, 상대적으로 투과전력은 증가하였다. 본 논문에서 제안된 구조에 대한 수치결과들은 기존 논문의 수치해석 방법인 PMM의 결과들과 비교하여 매우 잘 일치하였다.

Keywords

References

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