Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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In-situ Process Monitoring Data from 30-Paired Oxide-Nitride Dielectric Stack Deposition for 3D-NAND Memory Fabrication

  • Min Ho Kim (Department of Electronic Engineering, Myoungji University) ;
  • Hyun Ken Park (Department of Electronic Engineering, Myoungji University) ;
  • Sang Jeen Hong (Department of Electronic Engineering, Myoungji University)
  • Received : 2023.11.09
  • Accepted : 2023.12.12
  • Published : 2023.12.31
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Abstract

The storage capacity of 3D-NAND flash memory has been enhanced by the multi-layer dielectrics. The deposition process has become more challenging due to the tight process margin and the demand for accurate process control. To reduce product costs and ensure successful processes, process diagnosis techniques incorporating artificial intelligence (AI) have been adopted in semiconductor manufacturing. Recently there is a growing interest in process diagnosis, and numerous studies have been conducted in this field. For higher model accuracy, various process and sensor data are required, such as optical emission spectroscopy (OES), quadrupole mass spectrometer (QMS), and equipment control state. Among them, OES is usually used for plasma diagnostic. However, OES data can be distorted by viewport contamination, leading to misunderstandings in plasma diagnosis. This issue is particularly emphasized in multi-dielectric deposition processes, such as oxide and nitride (ON) stack. Thus, it is crucial to understand the potential misunderstandings related to OES data distortion due to viewport contamination. This paper explores the potential for misunderstanding OES data due to data distortion in the ON stack process. It suggests the possibility of excessively evaluating process drift through comparisons with a QMS. This understanding can be utilized to develop diagnostic models and identify the effects of viewport contamination in ON stack processes.

Keywords

Acknowledgement

This work was supported by the Technology Innovation Program Development Program-Semiconductor Display Development of Process Technology for Greenhouse Gas Reduction (00155753, GWP 1,000 or Less Chamber Cleaning Gas and its Remote Plasma System for Low GWP Gas) funded By the Ministry of Trade, Industry & Energy (MOTIE, Korea).

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