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Effect of Rapid Thermal Annealing on the Properties of Transparent Conducting ZnO/Ti/ZnO Thin Films

투명전극용 ZnO/Ti/ZnO 박막의 급속열처리 효과

  • Jin-Kyu, Jang (School of Materials Science and Engineering, University of Ulsan) ;
  • Daeil, Kim (School of Materials Science and Engineering, University of Ulsan)
  • 장진규 (울산대학교 첨단소재공학부) ;
  • 김대일 (울산대학교 첨단소재공학부)
  • Received : 2022.11.05
  • Accepted : 2022.11.28
  • Published : 2022.11.30

Abstract

Transparent conducting ZnO/Ti/ZnO tri-layer films deposited on glass substrate with DC and RF magnetron sputtering were rapid thermal annealed at 150, 300 and 450℃ for 5 minutes and then effect of annealing temperature on the structural and optoelectronics properties of the films were investigated. The structural properties are strongly related to annealing temperature and the largest grain size is observed in the films annealed at 450℃. The electrical resistivity also decreases as low as 7.7 × 10-4 Ωcm. The visible transmittance also depends on the annealing temperature. The films annealed at 450℃ show a higher transmittance of 80.6% in this study.

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References

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