Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Influence of electron irradiation on the structural and optoelectronics properties of ZTZ thin films prepared by magnetron sputtering

마그네트론 스퍼터링법으로 제조된 ZTZ 박막의 구조적 전기광학적 특성에 미치는 전자빔 조사의 영향

  • Cha, Byung-Chul (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology) ;
  • Jang, Jin-Kyu (School of Materials Science and Engineering, University of Ulsan) ;
  • Choi, Jin-Young (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology) ;
  • Lee, In-Sik (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology) ;
  • Kim, Dae-Wook (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology) ;
  • Kim, Yu-Sung (Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology) ;
  • Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
  • 차병철 (한국생산기술연구원 울산본부 첨단정형공정그룹) ;
  • 장진규 (울산대학교 첨단소재공학부) ;
  • 최진영 (한국생산기술연구원 울산본부 첨단정형공정그룹) ;
  • 이인식 (한국생산기술연구원 울산본부 첨단정형공정그룹) ;
  • 김대욱 (한국생산기술연구원 울산본부 첨단정형공정그룹) ;
  • 김유성 (한국생산기술연구원 울산본부 첨단정형공정그룹) ;
  • 김대일 (울산대학교 첨단소재공학부)
  • Received : 2022.11.01
  • Accepted : 2022.11.28
  • Published : 2022.12.31
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Abstract

Transparent ZnO/Ti/ZnO (ZTZ) tri-layered films were prepared with radio frequency (RF) and direct current (DC) magnetron sputtering on the glass substrate. The thickness of the ZnO and Ti films was kept at 50 and 10 nm to consider the effect of the electron irradiation on the crystallization and optoelectrical properties of the films. From the XRD spectra, post-depostion electron irradiated films showed the characteristic peaks of ZnO(002) and Ti(200), respectively. the observed grain size of the ZnO(002) and Ti(200) enlarged up to 18.27 and 12.16 nm at an irradiation condition of 750 eV. In the figure of merit which means an optoelectrical performance of the films, as deposited films show a figure of merit of 2.0×10-5 𝛺-1, while the films electron irradiated at 750 eV show a higher figure of merit of 5.7×10-5 𝛺-1.

Keywords

Acknowledgement

본 논문은 한국생산기술연구원 기관주요사업 "IMO대응 LNG선박 극저온 연료탱크 스마트 제조기술개발(3/6)(JA-22-0008)"의 지원으로 수행한 연구입니다.

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