전기전자학회논문지 (Journal of IKEEE)

  • 제25권3호
  • /
  • Pages.511-516
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  • 2021
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  • 1226-7244(pISSN)
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  • 2288-243X(eISSN)
한국전기전자학회 (Institute of Korean Electrical and Electronics Engineers)
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NiO 게이트 산화막에 의한 AlGaN/GaN MOSHFET의 전기적 특성 변화

The Impact of NiO on the Electrical Characteristics of AlGaN/GaN MOSHFET

  • Park, Yong Woon (School of Semiconductor Science and Technology/Semiconductor Physics Research Center, Chonbuk National University) ;
  • Yang, Jeon Wook (School of Semiconductor Science and Technology/Semiconductor Physics Research Center, Chonbuk National University)
  • 투고 : 2021.07.23
  • 심사 : 2021.09.28
  • 발행 : 2021.09.30
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초록

AlGaN/GaN 반도체 위에 금속이 접합된 HEMT와 SiO2와 NiO를 게이트 층간막으로 갖는 MOSHFET를 제작하고 NiO 박막에 따른 효과와 특성변화의 원인을 연구하였다. HEMT 구조에서 보인 -3.79 V의 문턱전압은 SiO2를 층간막으로 했을 때 - 5.52 V로 -1.73 V의 음방향 변화를, NiO를 층간막으로 했을 때 -2.76 V로 +1.03 V의 양방향 변화를 나타냈다. 또 NiO MOSFET의 경우 선형성이 증가하여 넓은 범위에 걸쳐 균일한 트랜스컨덕턴스 특성을 나타냈으며 0 V 이상의 게이트 전압에서는 HEMT와 SiO2 MOSHFET보다 더 높은 값을 보였다. 게이트에 입력된 펄스신호가 -5 V~0 V로 스윙할 때 HEMT의 포화 드레인 전류는 0.1 Hz~10 Hz의 주파수에서 20%의 감소를 보인 뒤 그 값을 유지하였으나, NiO MOSHFET은 10 Hz에서부터 지속적으로 감소하여 서로 다른 응답특성을 보였다.

The electrical characteristics of AlGaN/GaN/HEMT and MOSHFETs with NiO were studied. The threshold voltage of NiO MOSHFET revealed positive shift of +1.03 V than the -3.79 V of HEMT and negative shift of -1.73 V for SiO2 MOSHFET. Also, NiO MOSHFET showed better linearity in drain current corresponding to gate voltage and higher transconductance at positive gate voltage than the others. The response of gate pulse with base voltage of -5 V was different for both transistors as HEMT showed 20 % drain current decrease at the frequency range of 0.1 Hz~10 Hz and NiO MOSHFET decreased continuously above 10 Hz.

키워드

과제정보

This research was supported by Chonbuk National University.

참고문헌

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