반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

MgO-Al2O3-SiO2계 유리의 열물성과 내플라즈마성 연구

Study on Thermal Properties and Plasma Resistance of MgO-Al2O3-SiO2 Glass

  • Yoon, Ji Sob (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology) ;
  • Choi, Jae Ho (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology) ;
  • Jung, YoonSung (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology) ;
  • Min, Kyung Won (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology) ;
  • Im, Won Bin (Division of Materials Science and Engineering, Hanyang University) ;
  • Kim, Hyeong-Jun (Engineering Ceramic Center, Korea Institute of Ceramic Engineering and Technology)
  • 투고 : 2021.05.15
  • 심사 : 2021.06.18
  • 발행 : 2021.06.30
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초록

In this study, we studied the alternative of plasma resistant ceramic parts that constitute plasma chambers in the semiconductor dry etching process. MgO-Al2O3-SiO2(MAS) glass was made of 13 types of glass using the Design Of Experiments(DOE) and the effect on thermal properties such as glass transition temperature and crystallization temperature depending on the content of each composition and etching resistance to CF4/O2/Ar plasma gas. MAS glass showed excellent plasma resistance and surface roughness up to 20 times higher than quartz glass. As the content of Al2O3 and MgO increases, the plasma resistance is improved, and it has been confirmed that it has an inverse relationship with SiO2.

키워드

과제정보

이 논문은 중소벤처기업부가 후원하는 월드클래스300 프로젝트 연구 개발(R&D) 지원사업[프로젝트 번호: S2520985]과 한국연구재단(NRF)[NRF-2020M3H4A3106001]으로부터 지원을 받아 연구되었습니다.

참고문헌

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