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Adjusting the Sensitivity of an Active Pixel Sensor Using a Gate/Body-Tied P-Channel Metal-Oxide Semiconductor Field-Effect Transistor-Type Photodetector With a Transfer Gate

전송 게이트가 내장된 Gate/Body-Tied P-Channel Metal-Oxide Semiconductor Field-Effect Transistor 구조 광 검출기를 이용한 감도 가변형 능동 화소 센서

  • Jang, Juneyoung (School of Electronic and Electrical Engineering, Kyungpook National Unversity) ;
  • Lee, Jewon (System LSI Business Unit Sensor Design Team, Samsung Electronics) ;
  • Kwen, Hyeunwoo (School of Electronic and Electrical Engineering, Kyungpook National Unversity) ;
  • Seo, Sang-Ho (Korea Polytechnic) ;
  • Choi, Pyung (School of Electronic and Electrical Engineering, Kyungpook National Unversity) ;
  • Shin, Jang-Kyoo (School of Electronic and Electrical Engineering, Kyungpook National Unversity)
  • 장준영 (경북대학교 전자전기공학부) ;
  • 이제원 (삼성전자 System LSI 사업부 sensor 설계팀) ;
  • 권현우 (경북대학교 전자전기공학부) ;
  • 서상호 (한국폴리텍대학) ;
  • 최평 (경북대학교 전자전기공학부) ;
  • 신장규 (경북대학교 전자전기공학부)
  • Received : 2021.03.21
  • Accepted : 2021.03.30
  • Published : 2021.03.31

Abstract

In this study, the sensitivity of an active pixel sensor (APS) was adjusted by employing a gate/body-tied (GBT) p-channel metal-oxide semiconductor field-effect transistor (PMOSFET)-type photodetector with a transfer gate. A GBT PMOSFET-type photodetector can amplify the photocurrent generated by light. Consequently, APSs that incorporate GBT PMOSFET-type photodetectors are more sensitive than those APSs that are based on p-n junctions. In this study, a transfer gate was added to the conventional GBT PMOSFET-type photodetector. Such a photodetector can adjust the sensitivity of the APS by controlling the amount of charge transmitted from the drain to the floating diffusion node according to the voltage of the transfer gate. The results obtained from conducted simulations and measurements corroborate that, the sensitivity of an APS, which incorporates a GBT PMOSFET-type photodetector with a built-in transfer gate, can be adjusted according to the voltage of the transfer gate. Furthermore, the chip was fabricated by employing the standard 0.35 ㎛ complementary metal-oxide semiconductor (CMOS) technology, and the variable sensitivity of the APS was thereby experimentally verified.

Keywords

References

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