Acknowledgement
본 연구는 산업안전보건연구원의 자체연구과제로 수행한 결과입니다.
References
- Choi KM, Lee JE, Cho KY, Kim KS, Cho SH. Clean Room Structure, Air Conditioning and Contamination Control Systems in the Semiconductor Fabrication Process. J Korean Soc Occup Environ Hyg 2015;25(2):202-210. (http://dx.doi.org/10.15269/JKSOEH.2015.25.2.202)
- Choi KM, Yeo JH, Jung MK, Kim KS, Cho SH. Size, Shape, and Crystal Structure of Silica Particles Generated as By-products in the Semiconductor Workplace. J Korean Soc Occup Environ Hyg 2015;25(1):36-44. (http://dx.doi.org/10.15269/JKSOEH.2015.25.1.36)
- Chung EK, Kim KW, Ro JW, Jang MY. A study on the development of a guide for work environment management in LCD panel manufacturing processes. Occupational Safety and Health Research Institute Research Report. 2017.
- Chung EK, Kim KB, Song SW. Exposure Assessment and Management of Ionizing Radiation. J of the Korean Society of Safety 2015;25(1):27-35. (http://dx.doi.org/10.15269/JKSOEH.2015.25.1.27)
- Chung EK, Park HH, Shin JA, Jang JK. Assessment of hazardous substances and work environment for cleanrooms of microelectronic industry. J of the Korean Society of Safety 2009;19(3): 280-287.
- Hankookilbo. An employee of partner company of samsung semiconductor and LGD who died of lung cancer was recognized as and industrial accident 7 years after death. Sep. 21. 2020 [Accessed 17 June 2021] Available from: https://hankookilbo.com/News/Read /a2020092116240004572
- Hong JR, Koo JH, Park CS, Choi KM. Design of local exhaust ventilation for preventive maintenance in semiconductor fabrication industry using CFD. J Korean Soc Occup Environ Hyg 2019;29(2):208-216. (http://dx.doi.org/10.15269/JKSOEH.2019.29.2.208)
- Jones JH. Exposure and control assessment of semiconductor manufacturing. AIP Conference Proceeding 166,44(1988). Published Online 29 May 2008. (http://doi.org/10.1063/1.37130)
- Jung CY, Park HK, Lee DH. A Study for Development and Characteristics of Electrostatic Eliminateor Suitable for the Super Clean Room Less than Class 100(I). J of the KOSOS 2006;21(4) :60-65.
- Jeong PH, Lee DH. Development of Radiation Free Soft X-Ray Ionizer with Ion Control. J of the Korean Society of Safety 2016;31(5):22-27. https://doi.org/10.14346/JKOSOS.2016.31.5.22
- Kim KW, Jeong EK, Park SH, Kim KB, Lee KY, Park HD, Seo HK, Kang JH, Kim SH, Ro JW, Hwang ES. Characteristics of worker's exposure to hazardous agents in LCD panel manufactruing process. Occupational Safety and Health Research Institute Research Report. 2016.
- Lee SH, Lee DH. Development of Multi-Type Soft X-ray Ionizer using Radiation Dose Overlapped Effect. J of the Korean Society of Safety 2018;33(2):28-31. https://doi.org/10.14346/JKOSOS.2018.33.2.28
- Lim JW. Conformance of occupational diseases and cases of court rulings in the semiconductor industries. The proceeding of the 51th safety & health week seminar. 2018.
- Nuclear Safety and Security Commission (NSSC). Notice of Standard for radiation protection (2019-10). 2019.
- Nuclear Safety and Security Commission (NSSC). Enforcement Decree of Nuclear Safety Act. 2021.
- Park DU, Lee KM. Critical review of retrospective exposure assessment methods used to associate the reproductive and cancer risks of safer fabrication workers. J Korean Soc Occup Environ Hyg 2012;22(1):9-19.
- Park SH, Jeong EK. Development of guidance for work environment management in the semiconductor Industry. Occupational Safety and Health Research Institute Research Report. 2012.
- Park SH, Jeong EK, Shin JA, Lee KY, Park HD, Lee NR, Park HH, Kown JW, Seo HK, Kim KB, Jeong KJ. Work Environment and Exposure Characteristics for Hazardous Factors on the Workers in the Semiconductor Industry. Occupational Safety and Health Research Institute Research Report. 2012.
- Park SH, Park HD, Ro JW. Types & Characteristics of Chemical Substances used in the LCD Panel Manufacturing Process. J Korean Soc Occup Environ Hyg 2019;29(3):310-321. (https://doi.org/10.15269/JKSOEH.2019.29.3.310)
- Woskie SR, Hammond SK, Hines CJ, Hallock MF, Kenyon E, et al. Personal fluoride and solvent exposure, and their determinants, in semiconductor manufacturing. Applied Occupational Environmental Hygiene 2000;15:354-361 (https://doi.org/10.1080/104732200301476)