반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
권호 표지

대면적 스퍼터링 박막 제작을 위한 캐소드 설계 및 제작

Design and Preparation of Cathode for Large Sputtering Thin Film

  • 김유진 (가천대학교 전기공학과) ;
  • 김상모 (가천대학교 전기공학과) ;
  • 김경환 (가천대학교 전기공학과)
  • Kim, Yujin (Dept. of Electrical Engineering, Gachon University) ;
  • Kim, Sangmo (Dept. of Electrical Engineering, Gachon University) ;
  • Kim, Kyung Hwan (Dept. of Electrical Engineering, Gachon University)
  • 투고 : 2019.06.12
  • 심사 : 2019.06.18
  • 발행 : 2019.06.30
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초록

In this study, we prepared sputtering cathode for large sputtering thin film in the facing targets sputtering(FTS) system. Before fabrication of cathode equipment, we investigated optimal magnetic flux in the sputtering cathode by using magnetic field stimulation(Comsol). According to the result of magnetic field stimulation, we manufactured the cathode. After we mounted laboratory-designed cathode on FTS system, the discharge properties were observed in vacuum condition. In addition, ITO films were deposited on glass substrate and their electrical and optical properties were investigated by various measurements (four-point probe, UV-VIS spectrometer, field emission scanning electron microscopy(FE-SEM), Hall-effect measurement).

키워드

참고문헌

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