대면적 스퍼터링 박막 제작을 위한 캐소드 설계 및 제작

Design and Preparation of Cathode for Large Sputtering Thin Film

  • 김유진 (가천대학교 전기공학과) ;
  • 김상모 (가천대학교 전기공학과) ;
  • 김경환 (가천대학교 전기공학과)
  • Kim, Yujin (Dept. of Electrical Engineering, Gachon University) ;
  • Kim, Sangmo (Dept. of Electrical Engineering, Gachon University) ;
  • Kim, Kyung Hwan (Dept. of Electrical Engineering, Gachon University)
  • 투고 : 2019.06.12
  • 심사 : 2019.06.18
  • 발행 : 2019.06.30

초록

In this study, we prepared sputtering cathode for large sputtering thin film in the facing targets sputtering(FTS) system. Before fabrication of cathode equipment, we investigated optimal magnetic flux in the sputtering cathode by using magnetic field stimulation(Comsol). According to the result of magnetic field stimulation, we manufactured the cathode. After we mounted laboratory-designed cathode on FTS system, the discharge properties were observed in vacuum condition. In addition, ITO films were deposited on glass substrate and their electrical and optical properties were investigated by various measurements (four-point probe, UV-VIS spectrometer, field emission scanning electron microscopy(FE-SEM), Hall-effect measurement).

키워드

참고문헌

  1. H. Hosono, H. Ohta, M. Orita, K. Ueda, and M. Hirano, "Frontier of transparent conductive oxide thin films", Vacuum, Vol. 66, pp. 419-425, (2002). https://doi.org/10.1016/S0042-207X(02)00165-3
  2. S. Swanm, "Magnetron sputtering", Phys. Thecnol. 19, 1988.
  3. C. T. Liu, M. C. Lai, C. C. Hwang, C. H. Tu, L. Y. Liu, and Y. W. Hsu, "Enhancements of Substrate Deposition Rate and Target Erosion", IEEE Trans. Magn. Vol. 45, No. 10, 2009.
  4. M. A. Lieberman and A. J. Lichtenberg, "Principles of Plasma Discharges and Materials Processing", John Wiely & Sons, Second edition, 2005.
  5. P. C. Gregory, "Flexible flat panel displays", John Wiley & Sons, 2005.
  6. Y. S. Lee and H. B. Kim, "The Structure, Optical and Electrical Characteristics of AZO Thin Film Deposited on PET Substrate by RF Magnetron Sputtering Method", J. Semicond. Disp. Technol., Vol. 15, No. 4, pp. 36-40 2016.
  7. Y. Hoshi, H. Kato, and K. Funatsu, "Structure and electrical properties of ITO thin films deposited at high rate by facing target sputtering", Thin Solid Films, 445, pp. 245, 2003. https://doi.org/10.1016/S0040-6090(03)01182-9
  8. K. H. Kim, I. H. Son, K. B. Song, S. H. Kong, M. J. Keum, S. Nakagawa, and M. Naoe, "Thin film properties by facing targets sputtering system" Applied Surface Science, Vol. 169-170, pp. 410-414, 2001. https://doi.org/10.1016/S0169-4332(00)00694-2
  9. J. Lee, T. Y. Kang, and K. H. Kim, "Electrical Characteristics of the SiC SBD Prepared by using the Facing Targets Sputtering Method", J. Semicond. Disp. Technol., Vol. 14, No. 1. pp 27-30, 2015.
  10. H. Ki, Kim, S. W. Kim, K. H. Kim, "Direct Al cathode layer sputtering on LiF/$Alq_3$ using facing target sputtering with a mixture of Ar and Kr", App. Phys. Lett. Vol. 88, 2006.
  11. K. Tominaga, T. Ueda, T. Ao, A. Katkoka, and I. Mori, "ITO films prepared by facing target sputtering system", Thin Solid Films, Vol. 194, pp. 281-282, 1996.
  12. J. Liu, D. Wu, and S. Zeng, "Influence of temperature and layers on the characterization of ITO films", J. Mater. Process. Technol. Vol. 209, pp. 3943-3948, 2009. https://doi.org/10.1016/j.jmatprotec.2008.09.016
  13. S. -H. and K. M. Lee, "Structural and Electrical Characteristics of IZO Thin Films deposited at Different Substrate Temperature and Oxygen Flow Rate", J. Semicond. Disp. Technol., Vol. 11, No. 4, pp.25-30, 2012.
  14. H. W. Lee, B. S. Yang, S. Oh. Y. J. Kim, and H. J. Kim, "The Properties of RF Sputtered Zinc Tin Oxide Thin Film Transistors at Different Sputtering Pressure", Vol. 13, No. 1, pp. 43-49, 2014.
  15. J. W. Ko, B. Y. Jung, and T. Oh, "Annealing Effect with Various Ambient Conditions of ITO Thin Film", Journal of the Semiconductor & Display Technology, Vol. 14, No. 4, pp. 20-24, 2015.
  16. J. H. Kim, T. Y. Song, K. J. Ahn, K. B. Chung, H. J. Seok, H. J. Seo, and H. K. Kim, "The effects of film thickness on the electrical, optical, and structural properties of cylindrical, rotating, magnetron-sputtered ITO films", Appl. Surf. Sci. Vol. 440, No. 15, pp. 1211-1218, 2018. https://doi.org/10.1016/j.apsusc.2018.01.318