References
- K. Nakayama, T. Uemura, M. Uno, T. Okamoto, I. Osaka, K. Takimiya, J. Takeya, Curr. Appl. Phys. 12 (2012) S92. https://doi.org/10.1016/j.cap.2012.04.016
- D. Panigrahi, S. Kumar, A. Dhar, Polymer 130 (2017) 79. https://doi.org/10.1016/j.polymer.2017.09.065
- L. Pan, Z. Sun, Curr. Appl. Phys. 9 (2009) 1351. https://doi.org/10.1016/j.cap.2009.02.018
- A. Hashemi, A. Bahari, S. Ghasemi, Appl. Surf. Sci. 416 (2017) 234. https://doi.org/10.1016/j.apsusc.2017.04.154
- A. Hashemi, A. Bahari, Appl. Phys. A 123 (2017) 535. https://doi.org/10.1007/s00339-017-1152-6
- K. Ikegami, H. Ohnuki, M. Izumi, Curr. Appl. Phys. 6 (2006) 808. https://doi.org/10.1016/j.cap.2005.04.045
- L.S. Cardaso, J.C. Stefanelo, R.M. Faria, Synth. Met. 220 (2016) 286. https://doi.org/10.1016/j.synthmet.2016.06.023
- K. Takagi, T. Nagase, T. Kobyashi, H. Natio, Org. Electron. 32 (2016) 65. https://doi.org/10.1016/j.orgel.2016.02.011
- L. Li, W. Hu, L. Chi, H. Fuchs, J. Phys. Chem. B 114 (2010) 5315. https://doi.org/10.1021/jp100928d
- S. Jin, B.J. Jung, C.K. Song, J. Kwak, Curr. Appl. Phys. 14 (2014) 1809. https://doi.org/10.1016/j.cap.2014.10.019
- Z. Pan, L. Yao, J. Zhai, B. Shen, H. Wang, Compos. Sci. Technol. 147 (2017) 30. https://doi.org/10.1016/j.compscitech.2017.05.004
- W. Sun, H. Wu, X. Tan, M.R. Kessler, N. Bowler, Compos. Sci. Technol. 121 (2015) 34. https://doi.org/10.1016/j.compscitech.2015.10.022
- B. Arkles, Silane Coupling Agents: Connecting across Boundaries vol. 547, Gelest. Inc., 2011, pp. 1-9.
- M. Shahbazi, A. Bahari, S. Ghasemi, Org. Electron. 32 (2016) 100. https://doi.org/10.1016/j.orgel.2016.02.012
- A. Hashemi, A. Bahari, S. Ghasemi, J. Mater. Sci. Mater. Electron. 28 (2017) 13313. https://doi.org/10.1007/s10854-017-7167-0
- V.R. Reddy, A. Umapathi, L.D. Rao, Curr. Appl. Phys. 13 (2013) 1604. https://doi.org/10.1016/j.cap.2013.06.001
- Z. Bao, J. Locklin, Organic Field Effect Transistors, CRC Press, New york, 2007.
- M. Shahbazi, A. Bahari, S. Ghasemi, Synth. Met. 221 (2016) 332. https://doi.org/10.1016/j.synthmet.2016.09.007
- S. Faraji, T. Hashimoto, M.L. Turner, L.A. Majewski, Org. Electron. 17 (2015) 178. https://doi.org/10.1016/j.orgel.2014.12.010
- C.M. Keum, J.H. Bae, M.H. Kim, W. Choi, S.D. Lee, Org. Electron. 13 (2012) 778. https://doi.org/10.1016/j.orgel.2012.02.003
- M. Hayama, K-i. Yamamoto, F. Kohori, T. Uesaka, Y. Ueno, H. Sugaya, I. Itagaki, K. Sakai, Biomaterials 25 (2004) 119-128. https://doi.org/10.1016/S0142-9612(03)00484-8
- Ashland, PVP Polyvinlpyrrolidone Polymers, personalcare@ashland.com, 2014 Pc-12871.
- T. Watanabe, S. Hasegawa, N. Wakiyama, F. Usui, A. Kusai, T. Isobe, M. Senna, J. Solid State Chem. 164 (2002) 27. https://doi.org/10.1006/jssc.2001.9436
- A. Valles-Liuch, E. Costa, G.G. Ferrer, M.M. Pradas, M. Compose, Sci. Technol. 70 (2010) 1789.
- S. Saravanan, P.C. Ramamurthy, G. Madras, Compos. Sci. Technol. 96 (2014) 80. https://doi.org/10.1016/j.compscitech.2014.03.013
- R. Kamal, P. Chandravanshi, D.K. Choi, S.M. Bodade, Curr. Appl. Phys. 15 (2015) 648. https://doi.org/10.1016/j.cap.2015.02.017
- H. Tang, P. Wang, P. Zheng, X. Liu, Compos. Sci. Technol. 123 (2016) 134. https://doi.org/10.1016/j.compscitech.2015.12.015
- M.D. Morales-Acosta, C.G. Alvarado-Beltran, M.A. Quevedo-Lopez, B.E. Gnade, J. Non-Cryst. Solids 362 (2013) 124. https://doi.org/10.1016/j.jnoncrysol.2012.11.025
- B.-R. Wu, T.-H. Tsai, D.-S. Wuu, Appl. Surf. Sci. 354 (2015) 216. https://doi.org/10.1016/j.apsusc.2015.01.006
- A. Hashemi, A. Bahari, S. Ghasemi, J. Electron. Mater. 47 (2018) 3717. https://doi.org/10.1007/s11664-018-6231-8
- D. Dastan, S.L. Panahi, N.B. Chaure, J. Mater. Sci. Mater. Electron. 27 (2016) 12291. https://doi.org/10.1007/s10854-016-4985-4
- J. Wang, S. Liu, J. Wang, H. Hao, L. Zhao, J. Zhai, J. Alloys Compd. 726 (2017) 587. https://doi.org/10.1016/j.jallcom.2017.07.341
- T. Ideko, J. Oyama, P. Wightman, Surf. Interface Anal. 26 (1998) 39. https://doi.org/10.1002/(SICI)1096-9918(199801)26:1<39::AID-SIA346>3.0.CO;2-I
- R. Navamathavan, C.Y. Kim, A.S. Jung, J. Kor. Phys. Soc. 53 (2008) 351. https://doi.org/10.3938/jkps.53.351
- X. Wu, F. Fei, Z. Chen, W. Su, Z. Cui, Compos. Sci. Technol. 94 (2014) 117. https://doi.org/10.1016/j.compscitech.2014.01.024
- J.-H. Yim, Compos. Sci. Technol. 86 (2013) 45. https://doi.org/10.1016/j.compscitech.2013.06.023
- T.T. Dao, H. Murata, IEIEC Trans. Electron. E98-C (2015) 422. https://doi.org/10.1587/transele.E98.C.422
- A. Srivastava, R.K. Nahar b, C.K. Sarkar c, W.P. Singh d, Y. Malhotra, Microelectron. Reliab. 51 (2011) 751. https://doi.org/10.1016/j.microrel.2010.12.002
- R. Gholipur, A. Bahari, Mater. Res. Bull. 74 (2016) 70. https://doi.org/10.1016/j.materresbull.2015.10.015
- B. Soltani, M. Babaepour, A. Bahari, J. Mater. Sci. Mater. Electron. 28 (2017) 4378. https://doi.org/10.1007/s10854-016-6064-2
- Wei Ye, J. Deng, X. Wang, L. Cui, Appl. Surf. Sci. 390 (2016) 831-837. https://doi.org/10.1016/j.apsusc.2016.08.153
- C.G.A. Beltran, J.L.A. Sanchez, M.A. Lopez, R.R. Bon, Int. J. Electrochem. Sci. 10 (2015) 4068-4082.
- W. Huang, W. Shi, S. Han, J. Yu, AIP Adv. 3 (2013) 052122-052128. https://doi.org/10.1063/1.4807660
- W. Kim, A. Javey, O. Vermesh, Q. Wang, Y. Li, H. Dai, Nano Lett. 3 (2003) 193-198. https://doi.org/10.1021/nl0259232
Cited by
- Studying of SiO2/capron nanocomposite as a gate dielectric film for improved threshold voltage vol.125, pp.4, 2019, https://doi.org/10.1007/s00339-019-2547-3
- The evolution of MoS2 properties under oxygen plasma treatment and its application in MoS2 based devices vol.30, pp.19, 2018, https://doi.org/10.1007/s10854-019-02172-5
- Undoped and In3+-doped WO3 electrodes coated with Cu7Te4 nanocrystals and Bi2Te3 thin films: Investigation of morphological, structura vol.212, pp.None, 2018, https://doi.org/10.1016/j.ijleo.2020.164662