청정기술 (Clean Technology)

  • 제24권3호
  • /
  • Pages.175-182
  • /
  • 2018
  • /
  • 1598-9712(pISSN)
  • /
  • 2288-0690(eISSN)
한국청정기술학회 (The Korean Society of Clean Technology)
권호 표지
DOI QR코드

DOI QR Code

친환경 수계 박리액의 유동박리 공정 특성 및 청정성 연구

A Study on the Characteristics and Cleanliness of Fluidic Strip Process of Environment-Friendly Aqueous Stripper

  • 이기성 (서울과학기술대학교 나노IT융합대학원) ;
  • 이재원 (중원대학교 항공재료 공학과) ;
  • 김용성 (서울과학기술대학교 나노IT융합대학원)
  • Lee, Ki-Seong (Graduate School of NID Fusing Technology, Seoul National University of Science & Technology) ;
  • Lee, Jaeone (Department of Materials Science and Engineering of Aviation, Jungwon University) ;
  • Kim, Young Sung (Graduate School of NID Fusing Technology, Seoul National University of Science & Technology)
  • 투고 : 2018.06.18
  • 심사 : 2018.07.07
  • 발행 : 2018.09.28
PDF 다운로드
⟨ 이전 논문 다음 논문 ⟩

Abstract

본 연구에서는 유동박리공정에서 개발된 수계박리액의 수분함유량의 최적화를 통한 청정성을 연구하였다. 감광제 박리 특성을 상용 유기계 박리액과 비교 고찰하였다. 박리성능은 감광제의 패터닝 전 투명전극샘플과 코팅된 샘플을 박리 한 후의 투명전극표면에서의 전기 및 광학적 특성의 평가를 통해 비교 하였다. 상용화된 유기계 박리액과 수분함유량이 최적화된 수계 박리액의 감광제박리 공정 결과 수계박리액이 유기계 박리액보다 동등 이상의 우수한 전기 및 광학적 특성 결과를 나타내었다. 유동 박리공정에서 유기계 박리액은 박리 중 감광제가 용해되어 박리액내부로 용해가 된 반면, 개발 중인 수계박리액은 용제에 포함된 cyclodextrin에 의한 감광제 포집으로 박리액의 감광제 용해 감소의 효과가 나타난 것으로 판단된다. 이러한 박리 메커니즘의 차이에 의한 박리공정 후 유기계와 수계 박리액의 청정성을 비교 분석하였다.

In this research, we investigated the cleanliness by optimizing the water content of the aqueous stripper in fluidic strip process. The stripping properties of the photoresist with optimized aqueous stripper were compared with the commercial organic stripper. The stripping performance was evaluated by electrical and optical characteristics on the surface of the transparent electrode that compare with stripped the transparent electrode surface and the rare surface before patterning by the photoresist. As a result of the photoresist stripping process of the organic stripper and the aqueous stripper optimized for water content, the aqueous stripper exhibited better electrical and optical characteristics than the organic stripper. In the case of the fluidic strip process with organic stripper, the photoresist dissolves in the stripper solution during stripping which can cause re-adsorption by contamination. Whereas that the aqueous stripper under development seems to decrease the photoresist dissolution in the stripper solution. Because the cyclodextrin contained in the stripper captures organic photoresist into hall of cyclodextrin which stripped through swelling and tearing. The photoresist residue captured by the cyclodextrin can be filtered. After the fluidic stripping process by different chemical stripping mechanism, the cleanliness of the organic stripper and aqueous stripper was compared and analyzed.

Keywords

References

  1. https://www.marketsandmarkets.com/Market-Reports/displaymarket-925.html (Accessed Feb. 2017).
  2. Blaikie, R. J., Melville, D. O. S., and Alkaisi, M. M., "Super-Resolution Near-Field Lithography Using Planar Silver Lenses: A Review of Recent Developments," Microelectronic Eng., 83(4-9), 723-729 (2006). https://doi.org/10.1016/j.mee.2006.01.056
  3. Park, S.-H., Shin, J.-A., and Park, H.-D., "Exposure Possibility to By-products during the Processes of Semiconductor Manufacture," J. Korean Soc. Occupat. and Environ. Hygiene, 22(1), 52-59 (2012).
  4. http://k2b.kosha.or.kr/html/hmEnforcement.html (Accessed March 2018).
  5. Zhang, S., Hubis, E., Girard, C., Kumar, P., DeFranco, J., and Cicoira, F., "Water Stability and Orthogonal Patterning of Flexible Micro-Electrochemical Transistors on Plastic," J. Mater. Chem. C, 4, 1382-1385 (2016). https://doi.org/10.1039/C5TC03664J
  6. Ouyang, S., Xie, Y., Zhu, D., Xu, X., Wang, D., Tan, T., and Fong, H. H., "Photolithographic Patterning of PEDOT:PSS with a Silver Interlayer and Its Application in Organic Light Emitting Diodes," Organic Electronics, 15(8), 1822-1827 (2014). https://doi.org/10.1016/j.orgel.2014.05.004
  7. Yamamoto, N., Osone, S., Makino, H., and Yamamoto, T., "Influence of Alkaline Chemicals on Electrical and Optical Characteristics of Ga-Doped ZnO Transparent Thin Films," ECS Trans., 33(31), 29-36 (2011).
  8. Schofield, W. C. E., Bain, C. D., and Badyal, J. P. S., "Cyclodextrin-Functionalized Hierarchical Porous Architectures for High-Throughput Capture and Release of Organic Pollutants from Wastewater," Chem. Mater., 24(9), 1645-1653 (2012). https://doi.org/10.1021/cm300552k
  9. Chein, H., and Chen, T. M., "Emission Characteristics of Volatile Organic Compounds from Semiconductor Manufacturing," J. Air & Waste Manage. Assoc., 53(8), 1029-1036 (2012).
  10. Kim, J. H., Sim, J. M., Joo, G.-T., Kim, Y. S., and Jeong, B. H., "An Efficient Photoresist Stripping Process on the ITO Surface Using the Dipping Method," J. Korean Soc. Manufact. Technol. Eng., 25(4), 281-289 (2016). https://doi.org/10.7735/ksmte.2016.25.4.281
  11. Kim, J. H., Ko, H. H., Lee, K.-S., Joo, G.-T., and Kim, Y. S., "Investigation for Photoresist Stripping Conditions on the ITO Surface by the Multi-Spray Method," J. Korean Soc. Manufact. Technol. Eng., 27(1), 27-34 (2018). https://doi.org/10.7735/ksmte.2018.27.1.27
  12. Lee, K.-S., Jeon, J. W., Son, J. Y, Kim, J. H., Joo, G.-T., Jeong, B. H., Lee, D. W., and Kim, Y. S., "Characteristics and Cleanliness of Strip Process of Environment-Friendly Aqueous Stripper," J. Korean Soc. Manufact. Technol. Eng., 27(2), 154-159 (2018). https://doi.org/10.7735/ksmte.2018.27.2.154
  13. Burgess, A. A., and Brennan, D. J., "Application of Life Cycle Assessment to Chemical Processes," Chem. Eng. Sci., 56(8), 2589-2604 (2001). https://doi.org/10.1016/S0009-2509(00)00511-X
  14. http://airemiss.nier.go.kr (accessed Feb. 2017).
  15. http://netis.kemco.or.kr (accessed Feb. 2017).

Cited by

  1. Optimization of Photoresist Stripping Condition and Environmental Characteristics of Aqueous Stripper for Display Process vol.28, pp.2, 2018, https://doi.org/10.7735/ksmte.2019.28.2.71