참고문헌
- DeSimone, J. M., Romack, T. J., Betts, D. E., and Mcclain, J. B., "Cleaning Process Using Carbon Dioxide as a Solvent and Employing Molecularly Engineered Surfactants," U. S. Patent No. 5,866,005 (1999).
- Campbell, M. L., Apodaca, D. L., Yates, M. Z., McCleskey, T. M., and Birnbaum, E. R., "Metal Extractionfrom Heterogeneous Surfaces Using Carbon Dioxide Microemulsions," Langmuir, 17, 5458-5463 (2001). https://doi.org/10.1021/la0104166
-
Cooper, A. I., Wood, C. D., and Holmess, A. B., "Synthesis of Well-defined Macroporous Polymer Monoliths by Sol-gel Polymerization in Supercritical
$CO_2$ ," Ind. Eng. Chem. Res., 39, 4741-4744 (2000). https://doi.org/10.1021/ie000159k -
Hwang, H. S., Yuvaraj, H., Kim, W. K., Lee, W. K., Gal, Y. S., and Lim, K. T., "Dispersion Polymerization of MMA in Supercritical
$CO_2$ Stabilized by Random Copolymers of 1H, 1H-Perfluorooctyl Methacrylate and 2-(Dimethylaminoethyl Methacrylate)," J. Polym. Sci. : Part A: Polym. Chem., 46, 1365-1375 (2007). -
Ganapathy, H. S., Park, S. Y., Lee, W. K., Park, J. M., and Lim, K. T., "Polymeric Nanoparticles from Macroscopic Crystalline Monomers by Facile Solid-state Polymerization in Supercritical
$CO_2$ ," 51, 264-269 (2009). https://doi.org/10.1016/j.supflu.2009.08.016 - O'Shea, K. E., Kirmse, K. M., Fox, M. A., and Johnston, K. P., "Polar and Hydrogen-bonding Interactions in Supercritical Fluids. Effects on the Tautomeric Equilibrium of 4-(phenylazo)-1-naphthol," J. Phys. Chem., 95, 7863-7867 (1991). https://doi.org/10.1021/j100173a057
- Jones, C. A., Zweber, A., Deyoung, J. P., McClain, J. B., Carbonell, R., and DeSimone, J. M., "Applications of "Dry" Processing in the Microelectronics Industry Using Carbon Dioxide," Crit. Rev. Solid. State, 29, 97-109 (2004). https://doi.org/10.1080/10408430490888968
-
Weibel, G. L., and Ober, C. K., "An Overview of Supercritical
$CO_2$ Applications in Microelectronics Processing," Microelectron. Eng., 65, 145-152 (2003). https://doi.org/10.1016/S0167-9317(02)00747-5 - Kim, D. H., Lim, E. S., and Lim, K. T., "Efficient Stripping of High-Dose Ion-Implanted Photoresist in Supercritical Carbon Dioxide," Clean Technol., 17, 300-305 (2011).
- Kim, D. H., Lim, E. S., and Lim, K. T., "Efficient Stripping of High-dose Ion-implanted Photoresist in Supercritical Carbon Dioxide," Clean Technol., 17(4), 300-305 (2011). https://doi.org/10.7464/KSCT.2011.17.4.300
- Kim, D. W., Heo, H., and Lim, K. T., "Study of Supercritical Carbon Dioxide/n-Butyl Acetate Co-solvent System with High Selectivity in Photoresist Removal Process," Clean Technol., 23, 357-363 (2017).
- Kim, D. W., Kim, Y. H., and Lim, K. T., "Supercritical Carbon Dioxide Drying for MEMS Structures," J. Korean Soc. Imaging Sci. & Technol., 20(4), 16-21 (2014). https://doi.org/10.14226/KSIST.2014.20.4.03
-
Jung, J. M., Kwon, H. S., Lee, W.-K., Choi, B.-C., Kim, H. G., and Lim, K. T., "Repair of Plasma-Damaged p-SiOCH Dielectric Films in Supercritical
$CO_2$ ," Microelectron. Eng., 87, 1680-1684 (2010). https://doi.org/10.1016/j.mee.2009.11.049 -
Hwang, H. S., Bae, J. H., Jung, J. M., and Lim, K. T., "He Sacrificial Oxide Etching of Poly-Si Cantilevers Having High Aspect Atios Using Supercritical
$CO_2$ ," Microelectron. Eng., 87, 1696-1700 (2010). https://doi.org/10.1016/j.mee.2009.12.076 -
Jung, J. M., Yoon, E. J., Lim, E. S., Choi, B. C., Kim, S.-Y., and Lim, K. T., "The Dry Etching of TEOS Oxide for Poly-Si Cantilevers in Supercritical
$CO_2$ ," Microelectron. Eng., 88, 3448-3451 (2011). https://doi.org/10.1016/j.mee.2010.11.026 - Lee, M. Y., Do, K. M., Ganapathy, H. S., Lo, Y. S., Kim, J. J., Choi, S. J., and Lim, K. T., "Surfactant-Aided Supercritical Carbon Dioxide Drying for Photoresists to Prevent Pattern Collapse," J. Supercrit. Fluids, 42, 150-156 (2007). https://doi.org/10.1016/j.supflu.2006.12.014
- Tanaka, T., et al., "Mechanism of Resist Pattern Collapse during Development Process," 32 Issue 12 (1993).
- Bae, J. H, Md., Alam, Jung, J. M., Gal, Y.-S., Lee, H. S., Kim, H. G., and Lim, K. T., "Improved Etching Method for Microelectronic Devices with Supercritical Carbon Dioxide," Microelectron. Eng., 86, 128-131 (2009). https://doi.org/10.1016/j.mee.2008.10.003
-
Yuvaraj, H., Johnston, K. P., and Lim, K. T., "Removal of HF/
$CO_2$ Post-Etch Residues from Pattern Wafers Using Water-in-Carbon Dioxide Microemulsions, Jae Mok Jung, Hullathy Subban Ganapathy," Microelectron. Eng., 86, 165-170 (2009). https://doi.org/10.1016/j.mee.2008.09.006 -
Kim, S. H., Yuvaraj, H., Jeong, Y. T., Park, C., Kim, S. W., and Lim, K. T., "The Effect of Ultrasonic Agitation on the Stripping of Photoresist Using Supercritical
$CO_2$ and Co-Solvent Formulation," Microelectron. Eng., 86, 171-175 (2009). https://doi.org/10.1016/j.mee.2008.10.017