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연속공정기반 저온 상압 원자층 증착 시스템을 이용한 유무기 멀티레이어 배리어 박막에 관한 연구

A Study on the Organic-Inorganic Multilayer Barrier Thin Films Using R2R Low-Temperature Atmospheric-Pressure Atomic Layer Deposition System

  • 이재욱 (제주대학교 메카트로닉스공학과) ;
  • 김현범 (제주대학교 메카트로닉스공학과) ;
  • 최경현 (제주대학교 메카트로닉스공학과)
  • Lee, Jae-Wook (Department of Mechatronics Engineering, Jeju National University) ;
  • Kim, Hyun-Bum (Department of Mechatronics Engineering, Jeju National University) ;
  • Choi, Kyung-Hyun (Department of Mechatronics Engineering, Jeju National University)
  • 투고 : 2018.04.06
  • 심사 : 2018.04.25
  • 발행 : 2018.06.30

초록

In this paper, the organic material Poly(methyl methacrylate) PMMA is used with inorganic $Al_2O_3$ to fabricate organic-inorganic multilayer barrier thin films. The organic thin films are developed using a roll-to-roll electrohydrodynamic atomization system, whereas the inorganic are grown using a roll-to-roll low-temperature atmospheric pressure atomic layer deposition system. For the first time, these two technologies are used together to develop organic-inorganic multilayer barrier thin films in atmospheric condition. The films are grown under optimized parameters and classified into three classes based on the layer structures, when the total thickness of the barrier is maintained at ~ 160 nm. All classes of barriers show good morphological, optical and chemical properties. The $Al_2O_3$ films with a low average arithmetic roughness of 1.58 nm conceal the non-uniformity and irregularities in PMMA thin films with a roughness of 5.20 nm. All classes of barriers show a notably good optical transmission of ~ 85 %. The hybrid organic-inorganic barriers show water vapor and oxygen permeation in the range of ${\sim}3.2{\times}10^{-2}g/m^2/day$ and $0.015cc/m^2/day$ at $23^{\circ}C$ and 100% relative humidity. It has been confirmed that it can be mass-produced and used as a low-cost barrier thin film in various printing electronic devices.

키워드

참고문헌

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