한국기계가공학회지 (Journal of the Korean Society of Manufacturing Process Engineers)

  • 제17권3호
  • /
  • Pages.51-58
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  • 2018
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  • 1598-6721(pISSN)
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  • 2288-0771(eISSN)
한국기계가공학회 (The Korean Society of Manufacturing Process Engineers)
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연속공정기반 저온 상압 원자층 증착 시스템을 이용한 유무기 멀티레이어 배리어 박막에 관한 연구

A Study on the Organic-Inorganic Multilayer Barrier Thin Films Using R2R Low-Temperature Atmospheric-Pressure Atomic Layer Deposition System

  • 이재욱 (제주대학교 메카트로닉스공학과) ;
  • 김현범 (제주대학교 메카트로닉스공학과) ;
  • 최경현 (제주대학교 메카트로닉스공학과)
  • Lee, Jae-Wook (Department of Mechatronics Engineering, Jeju National University) ;
  • Kim, Hyun-Bum (Department of Mechatronics Engineering, Jeju National University) ;
  • Choi, Kyung-Hyun (Department of Mechatronics Engineering, Jeju National University)
  • 투고 : 2018.04.06
  • 심사 : 2018.04.25
  • 발행 : 2018.06.30
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초록

In this paper, the organic material Poly(methyl methacrylate) PMMA is used with inorganic $Al_2O_3$ to fabricate organic-inorganic multilayer barrier thin films. The organic thin films are developed using a roll-to-roll electrohydrodynamic atomization system, whereas the inorganic are grown using a roll-to-roll low-temperature atmospheric pressure atomic layer deposition system. For the first time, these two technologies are used together to develop organic-inorganic multilayer barrier thin films in atmospheric condition. The films are grown under optimized parameters and classified into three classes based on the layer structures, when the total thickness of the barrier is maintained at ~ 160 nm. All classes of barriers show good morphological, optical and chemical properties. The $Al_2O_3$ films with a low average arithmetic roughness of 1.58 nm conceal the non-uniformity and irregularities in PMMA thin films with a roughness of 5.20 nm. All classes of barriers show a notably good optical transmission of ~ 85 %. The hybrid organic-inorganic barriers show water vapor and oxygen permeation in the range of ${\sim}3.2{\times}10^{-2}g/m^2/day$ and $0.015cc/m^2/day$ at $23^{\circ}C$ and 100% relative humidity. It has been confirmed that it can be mass-produced and used as a low-cost barrier thin film in various printing electronic devices.

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참고문헌

  1. Martin, P. M., "Handbook of deposition technologies for films and coatings: science, applications and technology", Elsevier, pp. 135-139, 2009.
  2. Dameron, A. A., Davidson, S. D., Burton, B. B., Carcia, P. F., McLean, R. S., George, S. M., "Gas Diffusion Barriers on Polymers Using Multilayers Fabricated by Al2O3 and Rapid SiO2 Atomic Layer Deposition", The Journal of Physical Chemistry C, Vol. 112, No. 12, pp. 4573-4580, 2008. https://doi.org/10.1021/jp076866+
  3. Puurunen, R. L., "A short history of atomic layer deposition: Tuomo Suntola's atomic layer epitaxy", Chemical Vapor Deposition, Vol. 20, No. 10-12, pp. 332-344, 2014. https://doi.org/10.1002/cvde.201402012
  4. Munoz-Rojas, D., Nguyen, V. H., de la Huerta, C. M., Aghazadehchors, S., Jimenez, C., Bellet, D., "Spatial Atomic Layer Deposition (SALD), an emerging tool for energy materials. Application to new-generation photovoltaic devices and transparent conductive materials", Comptes Rendus Physique, Vol. 18, No. 7-8, pp. 391-400, 2017. https://doi.org/10.1016/j.crhy.2017.09.004
  5. Lee, J. S., Lee, J. H., Nam, S. B., Cho, Y. S., Go, M. S., Lee, S. J., Oh, D. K., Kim, J. D., Lee, J. H., Ok, J. G., "Development of a Compact Desktop-sized Roll-to-roll Nanoimprinting System for Continuous Nanopatterning," Journal of the Korean Society of Manufacturing Process Engineers, Vol. 16, No.1, pp. 96-101, 2017. https://doi.org/10.14775/ksmpe.2016.16.1.096
  6. Kim, H. B., Kim, K. H., Ghayas, S., Lim, J. H., Yang, H. C., Chio, K. H., "A Study on Organic/Inorganic Materials Deposition Using SAW-ED System", Journal of the Korean Society of Manufacturing Process Engineers, Vol. 15, No. 5, pp. 100-108, 2016. https://doi.org/10.14775/ksmpe.2016.15.5.100
  7. Choi, J., Lee, S., Kim, Y. J., Son, S. U., An, K. C., "High Aspect Ratio EHD Printing with High Viscosity Ink Ejection." Nanotech, Vol. 2, pp. 267-270, 2012.
  8. Ko, J. B., Kim, H. C., Yang, Y. J., Kim, H. B., Yang, S. W., Oh, S. H., Doh, Y. H., Choi, K. H., "Implementation of Biosensor Pattern Using Micro Patterning Technique", Journal of the Korean Society of Manufacturing Process Engineers, Vol. 15, No. 6, pp. 122-128, 2016. https://doi.org/10.14775/ksmpe.2016.15.6.122
  9. Xie, J., Jiang, J., Davoodi, P., Srinivasan, M. P., Wang, C. H., "Electrohydrodynamic atomization: A two-decade effort to produce and process micro-/nanoparticulate materials", Chemical engineering science, Vol. 125, pp. 32-57, 2015. https://doi.org/10.1016/j.ces.2014.08.061
  10. Xiao, W., Hui, D. Y., Zheng, C., Yu, D., Qiang, Y. Y., Ping, C., Xiang, C. L., Yi, Z., "A Flexible Transparent Gas Barrier Film Employing the Method of Mixing ALD/MLD-Grown Al2O3 and Alucone Layers", Nanoscale research letters, Vol. 10, No. 1, pp. 130, 2015. https://doi.org/10.1186/s11671-015-0838-y
  11. Zhang, F., Yang, W., Pang, A., Wu, Z., Qi, H., Yao, J., Fan, Z., Shao, J., "Annealing effects on the optical and structural properties of Al2O3/SiO2 films as UV antireflection coatings on 4H-SiC substrates", Applied Surface Science, Vol. 254, No. 20, pp. 6410-6415, 2008. https://doi.org/10.1016/j.apsusc.2008.04.015
  12. Koo, J., Kim, S., Jeon, S., Jeon, H., Won, Y., Kim, Y., "Characteristics of Al2O3 thin films deposited using dimethylaluminum isopropoxide and trimethylaluminum precursors by the plasma-enhanced atomic-layer deposition method.", Journal of the Korean Physical Society, Vol. 48, No. 1, pp. 131-136, 2006.