Abstract
In display and semi-conductor manufacturing process, there are numerous unstable factors such as particle concentration, minimal vibration, changes in magnetic field, or electrostatic that becomes an issue to be managed and controlled. In the recent, X-ray ionization is widely used that is neutralized by separating air or gas molecules in the area where the static must be resolved. The mono-type of X-ray ionizer was not capable to be used in $8^{th}$ generation panels manufacturing plant due to its insufficient ionizing coverage since the panel itself is approximately in $2m{\times}3m$. To resolve the current problem, the development of new type called, "Multi-type X-ray ionizer" has resulted in covering enough ionizing space in $8^{th}$ generation panels industry. Comparing mono and multi types with MCNPX code simulation, the multi one indicates more X-ray flux, efficiency, and ionization performance in comparison with either a mono-type or multi-type in array format. In addition, the ionizing efficiency of overlapping area with multi-type showed 30% higher effectiveness rate as to the ordinary mono-type.