Fig. 1. Schematic diagram of problem and improvement of Si anode material.
Fig. 2. Rotary kiln reactor.
Fig. 3. PC coating and CNF growth process diagram.
Fig. 4. PC coated Si for TEM analysis: thickness measurement with (a) 5 nm scale, (b) 10 nm scale, (c) 20 nm scale.
Fig. 5. Charge and discharge voltage profile of PC coated Si.
Fig. 6. Charge and discharge characteristics of PC coated Si up to 10 cycles: (a) capacity, (b) efficiency.
Fig. 7. SEM images of CNF: (a) 5 μm scale, (b) 1 μm scale, (c) 500 nm scale, (d) 500 nm scale after 6% hydrochloric acid treatment.
Fig. 8. TEM-EDS analysis: (a) TEM image of Fe catalyst, (b) EDS mapping of Fe catalyst, (c) TEM image for acid treatment, (d) EDS mapping for acid treatment.
Fig. 9. Component analysis of Si/C/CNF material after removal of Fe with acid treatment.
Fig. 10. Evaluation of reversible capacity of Si with CNF growth: (a) CNF 78 wt% growth, (b) CNF 100 wt% growth, (c) CNF 140 wt% growth.
Fig. 11. Charge and discharge characteristics of CNF 100 wt% up to 10 cycles: (a) capacity, (b) efficiency.
Table 1. Comparison of anode electrode properties for particle size controlled Si and coated Si and commercial SiO
Table 2. Charging and discharging voltage profile of Si/C/CNF
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