Journal of the Semiconductor & Display Technology (반도체디스플레이기술학회지)

The Korean Society Of Semiconductor & Display Technology (한국반도체디스플레이기술학회)
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Numerical Study on Flow and Heat Transfer in a CVD Reactor with Multiple Wafers

  • Jang, Yeon-Ho (Dept. of Mechanical Design Eng., College of Engineering, Chonbuk National University) ;
  • Ko, Dong Kuk (Dept. of Mechanical Eng., College of Engineering, Chonbuk National University) ;
  • Im, Ik-Tae (Dept. of Mechanical Design Eng., College of Engineering, Chonbuk National University)
  • Received : 2018.12.17
  • Accepted : 2018.12.21
  • Published : 2018.12.31
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Abstract

In this study temperature distribution and gas flow inside a planetary type reactor in which a number of satellites on a spinning susceptor were rotating were analyzed using numerical simulation. Effects of flow rates on gas flow and temperature distribution were investigated in order to obtain design parameters. The commercial computational fluid dynamics software CFD-ACE+ was used in this study. The multiple-frame-of-reference was used to solve continuity, momentum and energy conservation equations which governed the transport phenomena inside the reactor. Kinetic theory was used to describe the physical properties of gas mixture. Effects of the rotation speed of the satellites was clearly seen when the inlet flow rate was small. Thickness of the boundary layer affected by the satellites rotation became very thin as the flow rate increased. The temperature field was little affected by the incoming flow rate of precursors.

Keywords

References

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