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The development of ultra high-speed metal film deposition system and process technology for a heat sink in digital devices

디지털 소자용 방열판 제작을 위한 초고속 금속필름 증착장치 및 공정기술 개발

  • Yoon, Hyo Eun (Department of Physics & Nano Science, Sun Moon University) ;
  • Ahn, Seong Joon (Division of Mechanical and ICT Convergence Engineering, Sun Moon University) ;
  • Han, Dong Hwan (Department of BT-Convergent Pharmaceutical Engineering, Sun Moon University) ;
  • Ahn, Seungjoon (Division of Mechanical and ICT Convergence Engineering, Sun Moon University)
  • 윤효은 (선문대학교 나노과학과) ;
  • 안성준 (선문대학교 기계ICT융합공학부) ;
  • 한동환 (선문대학교 BT융합제약공학과) ;
  • 안승준 (선문대학교 기계ICT융합공학부)
  • Received : 2017.04.06
  • Accepted : 2017.07.07
  • Published : 2017.07.31

Abstract

To resolve the problem of the temperature rise in LED or OLED lighting, until now a thick metal film has been used as a heat-sink. Conventionally, this thick metal film is made by the electroplating method and used as the heat-dissipating plate of the electronic devices. However, nowadays there is increasing need for a Cu metal film with a thickness of several hundred micrometers that can be formed by the dry deposition method. In this work, we designed and fabricated a Cu film deposition system where the heating element is separated from the ceramic crucible, which makes ultra-rapid deposition possible by preventing heat loss. In addition, the resulting induction heating also contributes to the high deposition rate. By tuning the various parameters, we obtained a $100-{\mu}m$ thick Cu film whose heat conductivity is high and whose thickness uniformity is better than 2%, while the deposition rate is as high as $1000{\AA}/s$.

최근에 LED나 OLED와 같은 조명용 소자의 온도 상승에 따른 문제점을 개선하기 위하여 전기 도금 방법을 사용하여 제작한 두께가 두꺼운 금속 필름을 heat sink로 사용하고 있다. Cu 필름과 같은 두꺼운 금속 필름은 습식 방법인 전기 도금으로 제작하여 주로 소자의 방열판으로 사용되어 왔으나 건식의 증착 방법을 이용한 수 백 ${\mu}m$의 Cu 금속 필름에 대한 필요성이 요구되고 있다. 본 연구에서 설계 제작된 유도 가열 방식의 Cu 필름 증착 장비는 가열부가 세라믹 도가니 히터 부분과 세라믹 도가니 부분으로 분리된 이중 구조의 heating 방식을 채택하여 열 손실을 최소화 하고 보온 효과를 극대화시켰다. 또한 유도 가열 방식으로 초고속의 필름 증착 속도를 구현하였다. 그리고 열전도도가 높고 안정적인 두꺼운 Cu 필름 증착기술을 확보하고 최적화 하여 $1000{\AA}/s$의 증착율로 $100{\mu}m$의 필름을 증착 하였으며 ~2.0% 이내의 두께 균일도를 얻었다.

Keywords

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