DOI QR코드

DOI QR Code

Investigation of Low-Temperature Processed Amorphous ZnO TFTs Using a Sol-Gel Method

  • Chae, Seong Won (Graduate school of Advanced Circuit Substrate Engineering, Chungnam National University) ;
  • Yun, Ho Jin (Department of Electronics Engineering, Chungnam National Univ.) ;
  • Yang, Seung Dong (Department of Electronics Engineering, Chungnam National Univ.) ;
  • Jeong, Jun Kyo (Department of Electronics Engineering, Chungnam National Univ.) ;
  • Park, Jung Hyun (Department of Electronics Engineering, Chungnam National Univ.) ;
  • Kim, Yu Jeong (Department of Electronics Engineering, Chungnam National Univ.) ;
  • Kim, Hyo Jin (Graduate school of Advanced Circuit Substrate Engineering, Chungnam National University) ;
  • Lee, Ga-Won (Graduate school of Advanced Circuit Substrate Engineering, Chungnam National University)
  • Received : 2016.11.03
  • Accepted : 2017.01.15
  • Published : 2017.06.25

Abstract

In this paper, ZnO Thin Film Transistors (TFTs) were fabricated by a sol-gel method using a low-temperature process, and their physical and electrical characteristics were analyzed. To lower the process temperature to $200^{\circ}C$, we used a zinc nitrate hydrate ($Zn(NO_3)_2{\cdot}xH_2O$) precursor. Thermo Gravimetric Analyzer (TGA) analysis showed that the zinc nitrate hydrate precursor solution had 1.5% residual organics, much less than the 6.5% of zinc acetate dihydrate at $200^{\circ}C$. In the sol-gel method, organic materials in the precursor disrupt formation of a high-quality film, and high-temperature annealing is needed to remove the organic residuals, which implies that, by using zinc nitrate hydrate, ZnO devices can be fabricated at a much lower temperature. Using an X-Ray Diffractometer (XRD) and an X-ray Photoelectron Spectrometer (XPS), $200^{\circ}C$ annealed ZnO film with zinc nitrate hydrate (ZnO (N)) was found to have an amorphous phase and much more oxygen vacancy ($V_o$) than Zn-O bonds. Despite no crystallinity, the ZnO (N) had conductance comparable to that of ZnO with zinc acetate dihydrate (ZnO (A)) annealed at $500^{\circ}C$ as in TFTs. These results show that sol-gel could be made a potent process for low-cost and flexible device applications by optimizing the precursors.

Keywords

References

  1. E. M. Fortunato, Appl. Phys. Lett., 85, 2541 (2004). [DOI: http://dx.doi.org/10.1063/1.1790587]
  2. M. Rusop, Trans. Electr. Electron. Mater., 13, 102 (2012). [DOI: http://dx.doi.org/10.4313/TEEM.2012.13.2.102]
  3. S. M. Oh, M. G. Kang, Y. H. Do, C. Y. Kang, S. Nahm, and S. J. Yoon, Trans. Electr. Electron. Mater., 12, 222 (2011). [DOI: http://dx.doi.org/10.4313/TEEM.2011.12.5.222]
  4. L. W. Wang, F. Wu, D. X. Tian, W. J. Li, L. Fang, C. Y. Kong, and M. Zhou, J. Alloys & Compounds, 623, 367 (2015). [DOI: http://doi.org/10.1016/j.jallcom.2014.11.055]
  5. S. J. Sung, S. Park, S. Cha, W. J. Lee, C. H. Kim, and M. H. Yoon, RSC Advance, 5, 38125 (2015). [DOI: http://doi.org/10.1039/C5RA04515K
  6. S. Pourhashem, Ceramics International, 40, 993 (2014). [DOI: http://doi.org/10.1016/j.ceramint.2013.06.096]
  7. J. E. Lofgreen, Chem. Soc. Rev., 43, 991 (2014). [DOI: http://doi.org/10.1039/C3CS60276A]
  8. J. W. Hou, G. Dong, Y. Ye, and V. Chen, J. Membrane Science, 469, 19 (2014). [DOI: http://doi.org/10.1016/j.memsci.2014.06.027]
  9. G. H. Kim, J. Electronchem. Soc., 156, H7 (2009). [DOI: http://dx.doi.org/10.1149/1.2976027]
  10. S. J. Seo, Appl. Phys., 42, 035106-1 (2009). [DOI: http://dx.doi.org/10.1088/0022-3727/42/3/035106]
  11. W. H. Jeong, Appl. Phys. Lett., 96, 093503-1 (2010). [DOI: http://dx.doi.org/10.1063/1.3340943]
  12. Z. R. Khan, M. S. Khan, M. Zulfeguar, and M. S. Khan, Mater. Sci. Appl., 2, 340 (2011). [DOI: http://dx.doi.org/10.4236/msa.2011.25044]
  13. N. Shakti, Appl. Phys. Res., 2, 19 (2010). [DOI: http://dx.doi.org/10.5539/apr.v2n1p19]
  14. W. H. Jeong, IEEE, Electron Device Lett., 33, 68 (2012). [DOI: http://dx.doi.org/10.1109/LED.2011.2173897]
  15. I. Winer, G. E. Shter, M. M. Lahav, and G. S. Grader, J. Mater. Res., 26, 1309 (2011). [DOI: http://dx.doi.org/10.1557/jmr.2011.69]
  16. W. H. Jeong, ACS appl. Mater. & interfaces, 5, 9051 (2013). [DOI: http://dx.doi.org/10.1021/am4022818]

Cited by

  1. Investigations on the effects of electrode materials on the device characteristics of ferroelectric memory thin film transistors fabricated on flexible substrates vol.57, pp.3S1, 2018, https://doi.org/10.7567/JJAP.57.03DB02