Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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Microstructure, Crystal Structure and Mechanical Properties of VN Coatings Using Asymmetric Bipolar Pulsed dc Sputtering

비대칭 바이폴라 펄스 스퍼터법으로 증착된 VN 코팅막의 미세구조, 결정구조 및 기계적 특성에 관한 연구

  • Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University) ;
  • Jeong, Pyeong-Geun (Department of Advanced Materials Science and Engineering, Mokpo National University)
  • 전성용 (목포대학교 신소재공학과) ;
  • 정평근 (목포대학교 신소재공학과)
  • Received : 2016.09.01
  • Accepted : 2016.10.18
  • Published : 2016.10.31
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Abstract

Nanocrystalline vanadium nitride (VN) coatings were deposited using asymmetric bipolar pulsed dc sputtering to further understand the influence of the pulsed plasmas on the crystal structure, microstructure and mechanical properties. Properties of VN coatings were investigated with FE-SEM, XRD and nanoindentation. The results show that, with the increasing pulse frequency and decreasing duty cycle, the coating morphology changed from a porous columnar to a dense structure, with finer grains. Asymmetric bipolar pulsed dc sputtered VN coatings showed higher hardness, elastic modulus and residual compressive stress than dc sputtered VN coatings. The results suggest that asymmetric bipolar pulsed dc sputtering technique is very beneficial for the reactive sputtering deposition of VN coatings.

Keywords

References

  1. S. Y. Chun, A Comparative Study of Superhard TiN Coatings Deposited by DC and Inductively Coupled Plasma Magnetron Sputtering, J. Kor. Inst. Surf. Eng., 46 (2) (2013) 55-60. https://doi.org/10.5695/JKISE.2013.46.2.055
  2. M. Yang, W. Wang, Y. Lin, W. Yang, G. Li, Epitaxial growth of high quality AlN films on Si substrates, Mater. Lett., 182 (2016) 277-280. https://doi.org/10.1016/j.matlet.2016.07.003
  3. M. T. Hosseinnejad, M. Ghoranneviss, G. R. Etaati, M. Shirazi, Z. Ghorannevis, Deposition of tungsten nitride thin films by plasma focus device at different axial and angular positions, App. Surf. Sci., 257 (2011) 7653-7658. https://doi.org/10.1016/j.apsusc.2011.03.155
  4. R. Franz, C. Mitterer, Vanadium containing self-adaptive low-friction hard coatings for high-temperature applications: A review, Surf. Coat. Tech., 228 (2013) 1-13. https://doi.org/10.1016/j.surfcoat.2013.04.034
  5. Y. Wang, L. Jyh-Wei, D. Jenq-Gong, Mechanical strengthening in self-lubricating CrAlN/VN multilayer coatings for improved high-temperature tribological characteristics, Surf. Coat. Tech., 303 (2016) 12-17. https://doi.org/10.1016/j.surfcoat.2016.02.003
  6. M. Fallqvist, M. Olsson, The influence of surface defects on the mechanical and tribological properties of VN-based arc-evaporated coatings, Wear, 297 (2013) 1111-1119. https://doi.org/10.1016/j.wear.2012.11.012
  7. D. E. Macdonald, B. E. Rapuano, N. Deo, M. Stranick, P. Somasundaran, A. L. Boskey, Thermal and chemical modification of titanium-aluminum-vanadium implant materials: effects on surface properties, glycoprotein adsorption, and MG63 cell attachment, Biomaterials, 25 (2004) 3135-3146. https://doi.org/10.1016/j.biomaterials.2003.10.029
  8. G. Gassner, P. H. Mayrhofer, K. L. Kutschej, C. Mitterer, M. Kathrein, A New Low Friction Concept for High Temperatures: Lubricious Oxide Formation on Sputtered VN Coatings, Tribol. Lett., 17 (2004) 751-756. https://doi.org/10.1007/s11249-004-8083-z
  9. Q. Sun, Z. Wen Fu, Vanadium nitride as a novel thin film anode material for rechargeable lithium batteries, Electrochim. Acta, 54 (2008) 403-409. https://doi.org/10.1016/j.electacta.2008.07.057
  10. K. Yamamoto, S. Kujime, K. Takahara, Properties of nano-multilayered hard coatings deposited by a new hybrid coating process: Combined cathodic arc and unbalanced magnetron sputtering, Surf. Coat. Tech., 200 (2005) 435-439. https://doi.org/10.1016/j.surfcoat.2005.02.175
  11. Hanizam, H. Soufhwee A. R, K. Anuar A. R, A. R. M Nizam, N. Mohamad, The Effect of Pulse DC and DC Substrate Bias during in situ Cleaning PVD Process on Surface Roughness, Procedia Eng., 53 (2013) 562-568. https://doi.org/10.1016/j.proeng.2013.02.072
  12. J. Sellers, Asymmetric bipolar pulsed DC: the enabling technology for reactive PVD, Surf. Coat. Tech., 98 (1998) 1245-1250. https://doi.org/10.1016/S0257-8972(97)00403-9
  13. A. Anders, Physics of arcing, and implications to sputter deposition, Thin Solid Films, 502 (2006) 22-28. https://doi.org/10.1016/j.tsf.2005.07.228
  14. S. Y. Chun and T. Y. Lee, A Comparative Study of TiAlN Coatings Deposited by DC and Pulsed DC Asymmetric Bipolar Magnetron Sputtering, J. Kor. Inst. Surf. Eng., 47 (4) (2014) 168-173. https://doi.org/10.5695/JKISE.2014.47.4.168
  15. S. Y. Chun and B. H. Oh, A Comparative Study of NbN Coatings Deposited by DC and Pulsed DC Asymmetric Bipolar Magnetron Sputtering, J. Kor. Inst. Surf. Eng., 48 (4) (2015) 136-141. https://doi.org/10.5695/JKISE.2015.48.4.136
  16. S. Y. Chun and J. W. Beak, A Comparative Study of CrN Coatings Deposited by DC and Asymmetric Bipolar Pulsed DC Sputtering, J. Kor. Inst. Surf. Eng., 47 (2) (2014) 86-92. https://doi.org/10.5695/JKISE.2014.47.2.086
  17. F. Ge, P. Zhu, F. Meng, Q. Xue, F. Huang, Achieving very low wear rates in binary transition-metal nitrides: The case of magnetron sputtered dense and highly oriented VN coatings, Surf. Coat. Tech., 248 (2014) 81-90. https://doi.org/10.1016/j.surfcoat.2014.03.035
  18. Y. Qiu, S. Zhang, B. Li, J. Wei Lee, D. Zhao, Influence of Nitrogen Partial Pressure and Substrate Bias on the Mechanical Properties of VN Coatings, Procedia Eng., 36 (2012) 217-225. https://doi.org/10.1016/j.proeng.2012.03.034
  19. T. Nakano, C. Murata, S. baba, Effect of the target bias voltage during off-pulse period on the impulse magnetron sputtering, Vacuum, 84 (2010) 1368-1371. https://doi.org/10.1016/j.vacuum.2010.01.014
  20. M. Kumar, S. Mishra, R. Mitra, Effect of $Ar:N_2$ ratio on structure and properties of Ni-TiN nanocomposite thin films processed by reactive RF/DC magnetron sputtering, Surf. Coat. Tech., 228 (2013) 100-114. https://doi.org/10.1016/j.surfcoat.2013.04.014
  21. H. Du, H. Zhao, J. Xiong, W. Wan, Y. Wu, L. Wang, G. Xian, Effect of Ar/N2 flow ratio on oxidation resistance and properties of TiAl(La)N coatings, Int. J. Refract. Metals. Hard. Mater., 46 (2014) 173-180. https://doi.org/10.1016/j.ijrmhm.2014.06.012
  22. C. P. Constable, D. B. Lewis, J. Yarwood, W. D. Munz., Raman microscopic studies of residual and applied stress in PVD hard ceramic coatings and correlation with X-ray diffraction (XRD) measurements, Surf. Coat. Tech., 184 (2004) 291-297. https://doi.org/10.1016/j.surfcoat.2003.10.014
  23. D. W. Hoffmann, Stress and property control in sputtered metal films without substrate bias, Thin Solid Films 107 (1983) 353-358. https://doi.org/10.1016/0040-6090(83)90296-1
  24. G. Abadias, Stress and preferred orientation in nitride-based PVD coatings, Surf. Coat. Tech. 202 (2008) 2223-2235. https://doi.org/10.1016/j.surfcoat.2007.08.029
  25. J. M. Antunes, L. F. Menezes, J. V. Fernandes, Influence of Vickers tip imperfection on depth sensing indentation tests, Int. J. Solids Struct., 44 (2007) 2732-2747. https://doi.org/10.1016/j.ijsolstr.2006.08.017
  26. A. A. Elmustafa, D. S. Stone, Nanoindentation and the indentation size effect: Kinetics of deformation and strain gradient plasticity, J. Mech. Phys. Solids, 51 (2003) 357-381. https://doi.org/10.1016/S0022-5096(02)00033-9
  27. M. Wang, D. Wang, T. Kups, P. Schaaf, Size effect on mechanical behavior of Al/Si3N4 multilayers by nanoindentation, Mater. Sci. Eng. A 644 (2015) 275-283. https://doi.org/10.1016/j.msea.2015.07.071