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회절광학소자 제작을 위한 레이저 직접 노광기의 공정실험

Parametric Study for a Diffraction Optics Fabrication by Using a Direct Laser Lithographic System

  • 김영광 (과학기술연합대학원대학교 측정과학과) ;
  • 이혁교 (과학기술연합대학원대학교 측정과학과) ;
  • 김영식 (과학기술연합대학원대학교 측정과학과) ;
  • 이윤우 (과학기술연합대학원대학교 측정과학과)
  • Kim, Young-Gwang (Department of science and Measurement, University of Science and Technology) ;
  • Rhee, Hyug-Gyo (Department of science and Measurement, University of Science and Technology) ;
  • Ghim, Young-Sik (Department of science and Measurement, University of Science and Technology) ;
  • Lee, Yun-Woo (Department of science and Measurement, University of Science and Technology)
  • 투고 : 2016.05.31
  • 심사 : 2016.07.19
  • 발행 : 2016.10.01

초록

A direct laser lithography system is widely used to fabricate various types of DOEs (Diffractive Optical Elements) including lenses made as CGH (Computer Generated Hologram). However, a parametric study that uniformly and precisely fabricates the diffractive patterns on a large area (up to $200mm{\times}200mm$) has not yet been reported. In this paper, four parameters (Focal Position Error, Intensity Variation of the Lithographic Beam, Patterning Speed, and Etching Time) were considered for stabilization of the direct laser lithography system, and the experimental results were presented.

키워드

참고문헌

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