반도체디스플레이기술학회지 (Journal of the Semiconductor & Display Technology)

한국반도체디스플레이기술학회 (The Korean Society Of Semiconductor & Display Technology)
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전송선로를 이용한 플라즈마 전력 전달 연구

Research on Transmission Line Design for Efficient RF Power Delivery to Plasma

  • Park, In Yong (Department of Physics, Chungnam national university) ;
  • Lee, Jang Jae (Department of Physics, Chungnam national university) ;
  • Kim, Si-Jun (Department of Physics, Chungnam national university) ;
  • Lee, Ba Da (Department of Physics, Chungnam national university) ;
  • Kim, Kwang Ki (Department of Physics, Chungnam national university) ;
  • Yeom, Hee Jung (Department of Physics, Chungnam national university) ;
  • You, Shin Jae (Department of Physics, Chungnam national university)
  • 투고 : 2016.05.12
  • 심사 : 2016.06.10
  • 발행 : 2016.06.30
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초록

In RF plasma processing, when the plasma is generated, there is the difference of impedance between RF generator and plasma source. Its difference is normally reduced by using the matcher and the RF power is transferred efficiently from the power generator to the plasma source. The generated plasma has source impedance that it can be changed during processing by pressure, frequency, density and so on. If the range of source impedance excesses the matching range of the matcher, it cannot match all value of the impedance. In this research, we studied the elevation mechanism of the RF power delivery efficiency between RF generator to the plasma source by using the transmission line and impedance tuning of the plasma source. We focus on two plasma sources (capacitive coupled plasma (CCP), inductive coupled plasma (ICP)) which is most widely used in industry recently.

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참고문헌

  1. Alfred T.H.Chuang, Bojan O. Boskovic, John Robertson, "Freestanding Carbon Nanowalls by Microwave Plasma-enhanced Chemical Vapour Deposition", Diamond & Related Materials, Vol. 15, pp. 1103-1106, (2006). https://doi.org/10.1016/j.diamond.2005.11.004
  2. Dong Sun Kim, "Characterization and deposition of ZnO thin films by Reactive Magnetron Sputtering using Inductively-Coupled Plasma", Journal of the Semiconductor & Display Technology, Vol. 10, No.2, pp.89-89 (2011)
  3. J. Hopwood, "Review of Inductively coupled Plasmas for Plasma Processing", Plasma Sources Sci. Technol. Vol. 1, pp. 109-116, (1992). https://doi.org/10.1088/0963-0252/1/2/006
  4. E. F. Jaeger, L. A. Berry, J. S. Tolliver, and D. B. Batchelor, "Power Deposition in High-Density Inductively Coupled Plasma Tools for Semiconductor Processing", Phys. Plasmas., Vol. 2, pp. 2597-2604 (1995) https://doi.org/10.1063/1.871222
  5. David M. Pozar, Microwave engineering, 2nd ed. John Wiley & Sons., Inc., pp. 56-67, (2012).
  6. V. A. Godyak, R. B. Piejak and B. M. Alexandrovich, "Electrical characteristics and electron heating mechanism of an inductively coupled argon discharge", Plasma Sources Sci. Technol., Vol. 3, pp. 169-176, (1994). https://doi.org/10.1088/0963-0252/3/2/007
  7. V. A. Godyak, R. B. Piejak and B. M. Alexandrovich, "Electrical characteristics of parallel-plate RF discharges in argon", Plasma Sci. IEEE Trans., Vol. 19, pp. 660-676, (1991). https://doi.org/10.1109/27.90309
  8. V. Brouk and R. Heckman, "Stabilizing RF Generator and Plasma Interactions", 2004 SVC, Proc. of 47th Ann. Tech. Conf., pp. 49-54 (2004).
  9. Z. F. Ding, G. Y. Yuan, W. Gao and J. C. Sun, "Effects of impedance matching Network on the Discharge Mode Transitions in a Radio-Frequency Inductively Coupled Plasma", Phys. Plasmas, Vol. 15, 063506 (2008) https://doi.org/10.1063/1.2931038
  10. Sul Yong Tai, Lee Eui Yong, and Park Sung Jin, "Measurement Technology of Chamber Impedance for RF Matching", Journal of the Korean Society of Semiconductor Equipment Technology, Vol. 2, No. 4, pp. 13-17, (2003)
  11. Marwan H.Khater and Lawrence J. Overzet, "Stabilizing inductively coupled plasma source impedance and plasma uniformity using a Faraday shield", Journal of Vacuum Science & Technology A, Vol. 19, pp. 785-792 (2001) https://doi.org/10.1116/1.1355763
  12. Z. Chen, "Impedance Matching for One Atmosphere Uniform Glow Discharge Plasma(OAUGDP) Reactors", Plasma Sci. IEEE Trans., Vol. 30, No. 5, pp. 1922-1930, (2002). https://doi.org/10.1109/TPS.2002.805373
  13. Yaoxi Wu and M.A.Lieberman, "A Traveling Wave-driven, Inductively Coupled Large Area Plasma Source.", Appl. Phys. Lett., Vol. 72, pp. 777-779 (1998). https://doi.org/10.1063/1.120890