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A Study on the Characteristics of NiInZnO/Ag/NiInZnO Multilayer Thin Films Deposited by RF/DC Magnetron Sputter According to the Thickness of Ag Insertion Layer

RF/DC 마그네트론 스퍼터로 제조한 NiInZnO/Ag/NiInZnO 다층박막의 Ag 금속 삽입층 두께 변화에 따른 특성 연구

  • Kim, Nam-Ho (Dept. of Electrical Engineering, Chonnam National University) ;
  • Kim, Eun-Mi (Center for Nano-Photonics Convergence Technology, Korea Institute of Industrial Technology) ;
  • Heo, Gi-Seok (Center for Nano-Photonics Convergence Technology, Korea Institute of Industrial Technology) ;
  • Yeo, In-Seon (Dept. of Electrical Engineering, Chonnam National University)
  • Received : 2016.10.07
  • Accepted : 2016.11.27
  • Published : 2016.12.01

Abstract

Transparent, conductive electrode films, showing the particular characteristics of good conductivity and high transparency, are of considerable research interest because of their potential for use in opto-electronic applications, such as smart window, photovoltaic cells and flat panel displays. Multilayer transparent electrodes, having a much lower electrical resistance than widely-used transparent conducting oxide electrodes, were prepared by using RF/DC magnetron sputtering system. The multilayer structure consisted of three layers, [NiInZnO(NIZO)/Ag/NIZO]. The optical and electrical properties of the multilayered NIZO/Ag/NIZO structure were investigated in relation to the thickness of each layer. The optical and electrical characteristics of multilayer structures have been investigated as a function of the Ag and NIZO film thickness. High-quality transparent conductive films have been obtained, with sheet resistance of $9.8{\Omega}/sq$ for Ag film thickness of 8 nm. Also the multilayer films of inserted Ag 8 nm thickness showed a high optical transmittance above 93% in the visible range. The electrical and optical properties of the new multilayer films were mainly dependent on the thickness of Ag insertion layer.

Keywords

References

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