DOI QR코드

DOI QR Code

DC 스퍼터법과 비대칭 바이폴라 펄스 DC 스퍼터법으로 증착된 NbN 코팅막의 물성 비교연구

A Comparative Study of NbN Coatings Deposited by DC and Pulsed DC Asymmetric Bipolar Magnetron Sputtering

  • 전성용 (목포대학교 신소재공학과) ;
  • 오복현 (목포대학교 신소재공학과)
  • Chun, Sung-Yong (Department of Advanced Materials Science and Engineering, Mokpo National University) ;
  • Oh, Bok-Hyun (Department of Advanced Materials Science and Engineering, Mokpo National University)
  • 투고 : 2015.07.30
  • 심사 : 2015.08.24
  • 발행 : 2015.08.31

초록

The paper presents the comparative results of NbN coatings deposited by DC and pulsed DC asymmetric bipolar magnetron sputtering systems. The results show that, with the decreasing duty cycle and increasing pulse frequency, the coating morphology changes from a columnar to a dense structure, with finer grains. The Pulsed sputtered NbN coatings showed higher hardness, higher residual stress, and smaller grain sizes than those of DC prepared NbN coatings. Moreover residual stress of pulsed sputtered NbN coatings increased on increasing pulse frequency. Meanwhile, the surface roughness decreased continuously with increasing pulsed DC frequency up to 50 kHz.

키워드

참고문헌

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피인용 문헌

  1. Microstructure, Crystal Structure and Mechanical Properties of VN Coatings Using Asymmetric Bipolar Pulsed dc Sputtering vol.49, pp.5, 2016, https://doi.org/10.5695/JKISE.2016.49.5.461