Journal of the Korean Applied Science and Technology (한국응용과학기술학회지)

The Korean Society of Applied Science and Technology (한국응용과학기술학회)
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Improvement of PDMS graphene transfer method through surface modification of target substrate

폴리디메틸실록산(PDMS)을 이용한 그래핀 전사법 개선을 위한 계면처리 연구

  • Han, Jae-Hyung (School of Electronics Engineering, Kyungpook National University) ;
  • Choi, Mu-Han (School of Electronics Engineering, Kyungpook National University)
  • 한재형 (경북대학교 IT대학 전자공학부) ;
  • 최무한 (경북대학교 IT대학 전자공학부)
  • Received : 2015.04.21
  • Accepted : 2015.05.29
  • Published : 2015.06.30
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Abstract

In this paper, we study the dry transfer technology utilizing PDMS (Polydimethylsiloxane) stamp of a large single-layer graphene grown on Cu-foil as catalytic metal by using Chemical Vapor Deposition (CVD). By changing the surface property of the target substrate through $UV/O_3$ treatment, we can transfer the graphene on the target substrate while minimizing mechanical damages of graphene layer. Multi-layer (1~4 layers) graphene was stacked on $SiO_2/Si$ wafer successfully by repeating thetransfer method/process and then optical transmittance and sheet resistance of graphene layers have been measured as a quality assessment.

화학기상증착법(CVD)을 이용하여 Cu-foil 위에 합성된 대면적의 단층 그래핀(Graphene)을 폴리머 탄성융합체 PDMS(Polydimethylsiloxane)를 이용하여 건식으로 전사하는 기술을 연구하였다. 이때, $UV/O_3$처리를 통해 목표 기판(target substrate)의 표면 개질을 변화시켜 그래핀의 손상이 최소화되로록 그래핀을 전사하였다. 이 과정을 반복 실행하여 그래핀을 다층(1~4 layers)으로 $SiO_2/Si$기판 위에 적층하였으며, 전사된 다층 그래핀의 품질평가를 위하여 광투과율과 면저항의 변화를 측정하였다.

Keywords

References

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